Diffusion Processes in Ti–Si Systems during Silicide Formation von Bogdanov, S.E., Beddies, G., Daniel, M., Makogon, Yu.N.

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Formation and thermal stability of NiSi phase in Ni (30 nm)/Pt (2 nm; 6 nm)/Siep. (50 nm)/Si (001) thin film systems von Makogon, Iu.N., Pavlova, E.P., Sidorenko, S.I., Beddies, G., Beke, D.L., Csik, A., Verbitska, T.I., Fihurna, E.V., Shkarban, R.A.

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