Electron transport through nanocomposite SiO₂(Si) films containing Si nanocrystals von Bratus, O.L., Evtukh, A.A., Steblova, O.V., Prokopchuk, V.M.

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Structural properties of nanocomposite SiO₂(Si) films obtained by ion-plasma sputtering and thermal annealing von Bratus, O.L., Evtukh, A.A., Lytvyn, O.S., Voitovych, M.V., Yukhymchuk, V.О.

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Charge characteristics of the MOS structures with oxide films containing Si nanocrystals von Begun, E.V., Bratus’, O.L., Evtukh, A.A., Kaganovich, E.B., Manoilov, E.G.

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