Plasma cleaning of technological chambers in rf capacitive discharges von V. Lisovskij, Zh.-P. But, K. Landri, D. Due, V. Kasan

Volltext

Rf potential determination at the driven electrode in complex technological gas discharge set-up von V. Lisovskij, Zh.-P. But, K. Landri, D. Due, G. Renar, V. Kasan

Volltext