Empirical formula for the dependence of the “optical gap” value on the electron concentration Ne within the range of 10¹⁷cm⁻³ ≤Ne ≤ 10²²cm⁻³

за авторством Fedorovich, О.А.
Опубліковано 2013

On the dense plasma decay within the electron concentration range of 10¹⁷ cm⁻³≤Ne≤10²² cm⁻³

за авторством Fedorovich, О.А., Voitenko, L.M.
Опубліковано 2013

The bias voltage and its influence on the etching rate of silicon

за авторством Fedorovich, О.А., Hladkovskiy, V.V., Polozov, B.P., Kruglenko, М.P.
Опубліковано 2015