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G. A. Pashchenko
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Features of electrochemical processes at the boundary p-GaAs-HF water solution
by
G. A. Pashchenko
,
Yu. Kravetskyi
,
L. I. Trishchuk
Published 2018
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2
Modeling the process of removal aimed at cut traces on semiconductor wafers by using the method of contactless chemical-and-dynamical polishing
by
G. A. Pashchenko
,
Yu. Kravetskyi
,
A. V. Fomin
Published 2015
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Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
by
A. V. Fomin
,
G. A. Pashchenko
,
Yu. Kravetskyi
,
I. G. Lutsyshyn
Published 2017
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