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Hladkovskyi, V. V.
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Hladkovskyi, V. V.
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Hladkovskyi, V. V.
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Дослідження впливу кисню на швидкість і анізотропію глибинного травлення кремнію в плазмо-хімічному реакторі з керованим магнітним полем...
by
Hladkovskyi, V. V.
,
Fedorovich, O. A.
Published 2017
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2
Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃)
by
Fedorovich, O.A.
,
Hladkovska, O.V.
,
Hladkovskyi, V.V.
,
Nedybaliuk, A.F.
Published in
Вопросы атомной науки и техники
(2021)
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3
Features of the low energy protons interaction with molibden surface
by
Fedorovich, O.A.
,
Hladkovskyi, V.V.
,
Polozov, B.P.
,
Voitenko, L.M.
,
Kostin, E.G.
,
Rokitskyi, А.A.
,
Oberemok, А.S.
Published in
Вопросы атомной науки и техники
(2019)
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4
Рeculiarities of interaction of low-energy protons with tungsten surface
by
Fedorovich, O.A.
,
Hladkovskyi, V.V.
,
Polozov, B.P.
,
Voitenko, L.M.
,
Kostin, E.G.
,
Petriakov, V.А.
,
Rokitskyi, А.A.
,
Oberemok, А.S.
,
Burdin, V.V.
Published in
Вопросы атомной науки и техники
(2018)
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5
Interaction of low-energy protons with aluminum surface
by
Fedorovich, O.A.
,
Hladkovskyi, V.V.
,
Polozov, B.P.
,
Voitenko, L.M.
,
Kostin, E.G.
,
Rokitskyi, А.A.
,
Nedybaliuk, A.F.
,
Oberemok, А.S.
,
Burdin, V.V.
Published in
Вопросы атомной науки и техники
(2019)
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Related Subjects
Low temperature plasma and plasma technologies
Applications and technologies
anisotropy
deep etching of silicon
ion energy
plasma chemistry
Приложения и технологии
анізотропія
глибинне травлення кремнію
енергія іонів
магнітне поле
плазмохімія