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Influence of magnetic field configuration and strength on plasma parameters and efficiency of coatings deposition in magnetron sputtering system von Chunadra, А.G., Sereda, К.N., Tarasov, I.K., Makhlai, V.A., Kozhukhovskyi, B.M.
Veröffentlicht in Problems of Atomic Science and Technology (2022)Volltext
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