Optimization of conditions for treatment of ZnSe crystal surfaces by chemical etching von Tomashyk, V.M., Kravtsova, A.S., Tomashyk, Z.F., Stratiychuk, I.B., Galkin, S.M.

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Chemical-dynamic polishing of semiconductor materials based on Bi and Sb chalcogenides by using HNO₃–HCl solutions von Pavlovich, I.I., Tomashik, Z.F., Stratiychuk, I.B., Tomashik, V.M., Savchuk, O.A., Kravtsova, A.S.

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Peculiarities of ZnSe dissolution in H₂O₂—HBr -ethylene glycol (oxalic acid) etchant compositions von Kravtsova, A.S., Tomashyk, V.M., Tomashyk, Z.F., Stratiychuk, I.B., Kuryk, A.O., Kalytchuk, S.M., Galkin, S.M.

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