The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method за авторством Ievtushenko, A.I., Dusheyko, M.G., Karpyna, V.A., Bykov, O.I., Lytvyn, P.M., Olifan, O.I., Levchenko, V.A., Korchovyi, A.A., Starik, S.P., Tkach, S.V., Kuzmenko, E.F., Lashkarev, G.V.

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