Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures by V. V. Hladkovskiy, O. A. Fedorovich

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Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures by V. V. Hladkovskiy, O. A. Fedorovich

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Lifetime of electrons in dense plasma by O. A. Fedorovich, L. M. Voitenko

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Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field by V. V. Gladkovskij, O. A. Fedorovich

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Influence of the plasma chemical etching on the silicon plates surface of photo electric converters by B. P. Polozov, O. A. Fedorovich, V. N. Golotjuk, A. A. Marinenko, D. V. Lukomskij

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The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor "Almaz" for the synthesis of diamond-like... by V. V. Gladkovskij, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, V. A. Petrjakov

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Modulation polarimetry of full internal reflection, broken by diamond-like films by L. S. Maksimenko, O. N. Mishchuk, I. E. Matjash, B. K. Serdega, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, G. K. Savinkov

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