Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures за авторством V. V. Hladkovskiy, O. A. Fedorovich

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Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures за авторством V. V. Hladkovskiy, O. A. Fedorovich

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Lifetime of electrons in dense plasma за авторством O. A. Fedorovich, L. M. Voitenko

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Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field за авторством V. V. Gladkovskij, O. A. Fedorovich

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Influence of the plasma chemical etching on the silicon plates surface of photo electric converters за авторством B. P. Polozov, O. A. Fedorovich, V. N. Golotjuk, A. A. Marinenko, D. V. Lukomskij

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The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor "Almaz" for the synthesis of diamond-like... за авторством V. V. Gladkovskij, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, V. A. Petrjakov

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Modulation polarimetry of full internal reflection, broken by diamond-like films за авторством L. S. Maksimenko, O. N. Mishchuk, I. E. Matjash, B. K. Serdega, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, G. K. Savinkov

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