Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures

за авторством V. V. Hladkovskiy, O. A. Fedorovich
Опубліковано 2017

Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field

за авторством V. V. Gladkovskij, O. A. Fedorovich
Опубліковано 2017

Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures

за авторством V. V. Hladkovskiy, O. A. Fedorovich
Опубліковано 2017

Lifetime of electrons in dense plasma

за авторством O. A. Fedorovich, L. M. Voitenko
Опубліковано 2017

Influence of the plasma chemical etching on the silicon plates surface of photo electric converters

за авторством B. P. Polozov, O. A. Fedorovich, V. N. Golotjuk, A. A. Marinenko, D. V. Lukomskij
Опубліковано 2006

The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor "Almaz" for the synthesis of diamond-like carbon...

за авторством V. V. Gladkovskij, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, V. A. Petrjakov
Опубліковано 2014

Modulation polarimetry of full internal reflection, broken by diamond-like films

за авторством L. S. Maksimenko, O. N. Mishchuk, I. E. Matjash, B. K. Serdega, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, G. K. Savinkov
Опубліковано 2013