Diffusion processes in Ti–Si systems during silicide formation von S. E. Bogdanov, G. Beddies, M. Daniel, Yu. N. Makogon

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The structural-phase composition in CoSb1,82-5,45 (30 nm)-SiO2 (100 nm)-Si (001) nanoscaled film compositions after deposition and annealings von Ju. N. Makogon, E. P. Pavlova, S. I. Sidorenko, G. Beddis, M. Daniel, T. I. Verbitskaja, R. A. Shkarban, S. E. Bogdanov

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Diffusion under the Action of Shock Compression and Alternating Electric Current at High Temperatures von S. I. Kuchuk-Jatsenko, G. K. Kharchenko, V. M. Mironov, D. V. Mironov, V. F. Mazanko, D. S. Gertsriken, S. E. Bogdanov

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