Plasma cleaning of technological chambers in rf capacitive discharges von V. Lisovskij, Zh.-P. But, K. Landri, D. Due, V. Kasan

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The film cooling of the end wall of the nozzle apparatus von A. A. Khalatov, A. S. Kovalenko, A. V. Kuzmin, A. V. Lisovskij

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Rf potential determination at the driven electrode in complex technological gas discharge set-up von V. Lisovskij, Zh.-P. But, K. Landri, D. Due, G. Renar, V. Kasan

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