Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering

за авторством V. I. Popovych, A. I. Yevtushenko, O. S. Lytvyn, V. R. Romaniuk, V. M. Tkach, V. A. Baturyn, Ye. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. H. Dusheiko, V. A. Karpyna, H. V. Lashkarov
Опубліковано 2016