Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field за авторством V. V. Gladkovskij, O. A. Fedorovich

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The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor "Almaz" for the synthesis of diamond-like... за авторством V. V. Gladkovskij, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, V. A. Petrjakov

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