Optical Recording of Micro- and Nano- Relief Structures on Inorganic Resists Ge-Se

• Main Authors: Indutny, I. Z., Kryuchyn, A. A., Borodin, Yu. A., Danko, V. A., Lukanyuk, M. V., Minko, V. I., Shepelyavyi, P. E., Gera, E. V., Rubish, V. M.
• Format: Article
• Language: rus
• Published: Інститут проблем реєстрації інформації НАН України 2013
• Subjects: неорганічний фоторезист; оптичний запис; мікрорельєфні структури; неорганический фоторезист; оптическая запись; микрорелъефные структуры; inorganic photo-resist; optical recording; micro-relief structure
• Online Access: http://drsp.ipri.kiev.ua/article/view/103416

The results of experimental studies on recording of microrelief structures using a focused laser radiation with a wavelength of 405 nm to photoresist films of inorganic system Ge-Se have been presented. It is shown that the microrelief structures having depth of 100 nm can be obtained on the inorgan...