ICRF plasmas for fusion reactor applications

• Main Authors: Lyssoivan, A., Koch, R., Van Eester, D., Van Schoor, M., Van Wassenhove, G., Vervier, M., Weynants, R., Buermans, J., Matthys, T., Esser, H.G., Marchuk, O., Neubauer, O., Philipps, V., Sergienko, G., Bobkov, V., Fahrbach, H.-U., Hartmann, D.A., Herrmann, A., Noterdaeme, J.-M., Rohde, V., Beaumont, B., Gauthier, E., Glazunov, G.P., Lozin, A.V., Moiseenko, V.E., Nazarov, N.I., Shvets, O.M., Stepanov, K.N., Volkov, E.D., Beigman, I.L., Vainshtein, L.A.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2007
• Series: Вопросы атомной науки и техники
• Subjects: ITER and fusion reactor aspects
• Online Access: http://dspace.nbuv.gov.ua/handle/123456789/110347

The ICRF plasma production technique is considered as a promising alternative tool for the following applications in the present and next generation superconducting fusion devices: (i) Wall conditioning in the presence of permanent high magnetic field; (ii) Assistance for the tokamak start-up at low...