EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges
This work presents preliminary results of an extreme ultraviolet emission obserwations of a capillary discharge plasma. The main purpose of measurements was to demonstrate the spectral range covered by the system working parameters. The spectroscopic studies were carried out by means of an XEUV spec...
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| Дата: | 2008 |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2008
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| Назва видання: | Вопросы атомной науки и техники |
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| Цитувати: | EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges / K.Nowakowska-Langier, L. Jakubowski, E.O. Baronova, K. Czaus, M. Rabinski, R. Mirowski, M.J. Jakubowski, A. Wiraszka // Вопросы атомной науки и техники. — 2008. — № 6. — С. 213-215. — Бібліогр.: 13 назв. — англ. |
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irk-123456789-1110292017-01-08T03:03:45Z EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges Nowakowska-Langier, K. Jakubowski, L. Baronova, E.O. Czaus, K. Rabinski, M. Mirowski, R. Jakubowski, M.J. Wiraszka, A. Plasma diagnostics This work presents preliminary results of an extreme ultraviolet emission obserwations of a capillary discharge plasma. The main purpose of measurements was to demonstrate the spectral range covered by the system working parameters. The spectroscopic studies were carried out by means of an XEUV spectrometer in the Johann geometry. The results provide general information about the radiation processes from the xenon, argon and tin plasma in the range from 12 to 63 nm. Представлено перші результати спостереження емісії вакуумного ультрафіолетового (ВУФ) випромінювання в плазмі капілярного розряду. Основною метою вимірів була демонстрація покриття спектрального діапазону робочими параметрами системи. Спектроскопічні дослідження проведені за допомогою ВУФ спектрометра Джоханнівської геометрії. Результати подають загальну інформацію про процеси випромінювання з ксенонової, аргонової і свинцевої плазми в діапазоні від 12 до 63 нм. Представлены первые результаты наблюдения эмиссии вакуумного ультрафиолетового (ВУФ) излучения в плазме капиллярного разряда. Основной целью измерений являлась демонстрация покрытия спектрального диапазона рабочими параметрами системы. Спектроскопические исследования проведены с помощью ВУФ спектрометра Джоханновской геометрии. Результаты дают общую информацию о процессах излучения из ксеноновой, аргоновой и свинцовой плазмы в диапазоне от 12 до 63 нм. 2008 Article EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges / K.Nowakowska-Langier, L. Jakubowski, E.O. Baronova, K. Czaus, M. Rabinski, R. Mirowski, M.J. Jakubowski, A. Wiraszka // Вопросы атомной науки и техники. — 2008. — № 6. — С. 213-215. — Бібліогр.: 13 назв. — англ. 1562-6016 PACS: 52.50.Dg , 52.80.Yr, 52.70 http://dspace.nbuv.gov.ua/handle/123456789/111029 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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English |
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Plasma diagnostics Plasma diagnostics |
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Plasma diagnostics Plasma diagnostics Nowakowska-Langier, K. Jakubowski, L. Baronova, E.O. Czaus, K. Rabinski, M. Mirowski, R. Jakubowski, M.J. Wiraszka, A. EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges Вопросы атомной науки и техники |
| description |
This work presents preliminary results of an extreme ultraviolet emission obserwations of a capillary discharge plasma. The main purpose of measurements was to demonstrate the spectral range covered by the system working parameters. The spectroscopic studies were carried out by means of an XEUV spectrometer in the Johann geometry. The results provide general information about the radiation processes from the xenon, argon and tin plasma in the range from 12 to 63 nm. |
| format |
Article |
| author |
Nowakowska-Langier, K. Jakubowski, L. Baronova, E.O. Czaus, K. Rabinski, M. Mirowski, R. Jakubowski, M.J. Wiraszka, A. |
| author_facet |
Nowakowska-Langier, K. Jakubowski, L. Baronova, E.O. Czaus, K. Rabinski, M. Mirowski, R. Jakubowski, M.J. Wiraszka, A. |
| author_sort |
Nowakowska-Langier, K. |
| title |
EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges |
| title_short |
EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges |
| title_full |
EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges |
| title_fullStr |
EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges |
| title_full_unstemmed |
EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges |
| title_sort |
euv emission spectra from excited ar, xe and sn ions produced in capillary discharges |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2008 |
| topic_facet |
Plasma diagnostics |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/111029 |
| citation_txt |
EUV emission spectra from excited Ar, Xe and Sn ions produced in capillary discharges / K.Nowakowska-Langier, L. Jakubowski, E.O. Baronova, K. Czaus, M. Rabinski, R. Mirowski, M.J. Jakubowski, A. Wiraszka // Вопросы атомной науки и техники. — 2008. — № 6. — С. 213-215. — Бібліогр.: 13 назв. — англ. |
| series |
Вопросы атомной науки и техники |
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| fulltext |
PLASMA DIAGNOSTICS
EUV EMISSION SPECTRA FROM EXCITED Ar, Xe AND Sn IONS
PRODUCED IN CAPILLARY DISCHARGES
K. Nowakowska-Langier1, L. Jakubowski1, E.O. Baronova2,
K. Czaus1, M. Rabinski1, R. Mirowski1, M.J. Jakubowski1, A. Wiraszka1
1The Andrzej Soltan Institute for Nuclear Studies (IPJ), 05-400 Otwock-Swierk, Poland,
E-mail: k.nowakowska-langier@ipj.gov.pl;
2Nuclear Fusion Institute, NRC Kurchatov Institute, 123182 Moscow, Russia
This work presents preliminary results of an extreme ultraviolet emission obserwations of a capillary discharge plasma.
The main purpose of measurements was to demonstrate the spectral range covered by the system working parameters.
The spectroscopic studies were carried out by means of an XEUV spectrometer in the Johann geometry. The results
provide general information about the radiation processes from the xenon, argon and tin plasma in the range from 12 to
63 nm.
PACS: 52.50.Dg , 52.80.Yr, 52.70
INTRODUCTION
Gas discharges in capillary are the promising
candidates for generation of EUV radiation and thus are
quite often studied by various experimental techniques [1-
8]. There are studied as intense soft X-ray sources and a
cheap alternative to laser-plasma, free-electron,
synchrotron sources, as well as sources based on higher
harmonics generation. These sources are of potential
interest in a wide field of applications such as
lithography, holography, characterization of material and
microscopy [9,10]
The capillary construction is a very simple but it
creates a sophisticated multiparametric system. The
device consists of a non-conductive duct placed between
two electrodes which are connected to a bank of low-
inductance high voltage (HV) capacitors charged to
several of kV. Driver characteristics (current amplitude,
current rise-time), initial conditions (gas pressure, pre-
pulse capillary current) and boundary conditions (length
and diameter, material of capillary and electrodes) are
important for achieving an efficient population in gas
discharges. It is desirable to find optimal conditions,
especially initial conditions of the discharge, to get from
the device coherent EUV radiation with good
repeatability [11].
In this paper we made a first step in observations of
extreme ultraviolet emission from capillary discharges.
Mainly we studied the spectral range over which the
system was capable to work and provide general
information about the radiative processes in the plasma
generated in our capillary device.
EXPERIMENT
A cross sectional view of the capillary discharge
experimental setup used for generating the EUV radiation
is shown in Fig.1. The discharge setup consists of a brass
electrode and an alumina capillary of 1,5 mm inner
diameter and 8-mm length.
Fig. 1. The experimental setup for the capillary discharge
measurements. A - the capillary discharge device,
B - the spectrometer
The capillary was mounted between two specially
designed electrodes with the help of an electrically
insulating holder, in such a manner that the two ends of
capillary had good contact with electrodes. The discharge
voltage of the condenser battery of 0,375 µF was equal to
8 kV (I=~3,5kA achieved in about 1 µs). The capillary
was evacuated below 10-5 mbar using a turbo-molecular
pump (Pfeiffer TC100). The processes were conducted
with two kinds of the filing gas: pure xenon or argon. The
working gas flows through the capillary and was
differentially pumped out from the system. The gas
pressure near the electrodes was controlled up to tens of
Pa. Number of single discharges was equal to one
thousand. In case of Sn ions registration a tin insert was
mounted in the brass anode (see Fig.1).
The spectroscopic studies were carried out by means
of the XEUV spectrometer in the Johann geometry. The
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2008. № 6. 213
Series: Plasma Physics (14), p. 213-215.
B
A
mailto:k.nowakowska-langier@ipj.gov.pl
spectrometer uses a 524 mm radius rectangular gold coated
grating of 4200 lines/mm. Grating size is:
LxHxW = 40x30x8 mm. Our experiments demanded a
very precise justification and calculation of correct position
of all elements. A calibration was performed using a red
laser light (λ=630nm). In our experiment the spectrums
were taken at incident angle 110 degrees thought 1,5 mm
slit. The grating, the slit and detector (film) are exactly
mounted on the Rowland circle (R = 262 mm). It was
calculated that in this configuration the spectrometer covers
a wavelength range of 12–65 nm. The radiation was
registered on the Kodak BioMax MS films. The capillary
unit was connected with the spectrometer by metal tube,
which was pumped during the process.
RESULTS AND DISCUSSION
The emission spectra taken in the EUV radiation region
obtained in the present experiment are shown in Fig.2 -
Fig.4. Fig.2 and Fig.3. show a spectrums obtained in
argon and xenon filled capillary and Fig.4 shows the
radiation from argon filled capillary where the Sn insert
was mounted in brass anode (Fig 1). The main purpose of
the spectroscopic measurements of capillary discharges
was to demonstrate the spectral range over which the
system was capable of working.
In our experiment the spectrums were registered in the
12 - 64 nm, 12- 61 nm and 15- 55 nm wavelength ranges
for Xe, Ar, and Sn + Ar ions, respectively. Some of the
spectral lines were assigned to the corresponding
wavelengths. Spectrums identification is not too easy
because of numerous lines corresponding to material of
brass electrodes.
The analysis of the emitted spectra shows the presence of
different lines corresponding to xenon (XeVII, XeVIII,
XeIX [12]) and argon (ArII, ArIV – ArIX [2,12,13]) ions,
originating from the working gas, as well as tin (SnV
[12]), copper (CuIV, CuV, CuXVIII, CuXIX [13]),
oxygen (OV, OII [12]) and aluminium ions (AlVI, AlVII
[12]), originating from the material released from the
electrodes and from the alumina capillary. The lines of
argon, xenon and tin ions are marked with black arrows.
A lot of lines overlap and thus they are very difficult to
the identification.
Fig. 2. EUV spectra of the radiation from a Xe capillary
discharge in the 12–65 nm spectral region at 30Pa gas
pressure
Fig. 3. EUV spectra of the radiation from an Ar capillary
discharge in the 12–60 nm spectral region at 40Pa gas
pressure
Fig. 4. EUV spectra of the radiation from an Ar filled
capillary discharge with Sn inser in the 15–55 nm
spectral region at 40Pa gas pressure
We learned from our measurements that a significant
problem of debris generation exists. The brass electrode
and alumina capillary ablates what leads to gradual
enlargement of an inner diameter. The material ablated
from the capillary when the electrodes’ walls absorb
energy can introduce difficulties in laser amplifications. A
melting and evaporation probably were caused by
interaction between the heat loads from the pinching
plasma and the surface.
This founding contributed to improvements of the
capillary discharge device. We have changed some of the
parameters of processes and the material of the electrodes
to reduce evaporation which enhanced the quality of
generated radiation. Currently observations of EUV
radiation from capillary discharges with tungsten
electrodes and with the higher current are carried out.
CONCLUSIONS
The results of our investigation show that the
capillary discharge is the interesting object to study. We
measured the EUV emission spectra of Xe, Ar and Sn in
the range of 12-65 nm, generated in the small capillary
device. The spectroscopic studies were carried out by
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15 20 25 30 35 40 45 50 55 60
15 20 25 30 35 40 45 50 55
means of the XEUV spectrometer. The spectrums were
registered in the 12 - 64 nm, 12- 61 nm and 15- 55 nm
wavelength ranges for Xe, Ar, and Sn + Ar ions,
respectively. Additionally we learned that the brass
electrode and alumina capillary ablates and therefore a
problem of debris generation exists.
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Article received 23.09.08.
ВУФ- ЭМИССИОННЫЕ СПЕКТРЫ ВОЗБУЖДЕННЫХ Ar, Xe И Sn ИОНОВ, ПРОИЗВЕДЕННЫХ
В КАПИЛЛЯРНОМ РАЗРЯДЕ
K. Новаковская-Лангиер, Л. Якубовский, E.О. Баронова,
K. Чаус, M. Рабинский, Р. Мировский, M. Якубовский, A. Виражка
Представлены первые результаты наблюдения эмиссии вакуумного ультрафиолетового (ВУФ) излучения в
плазме капиллярного разряда. Основной целью измерений являлась демонстрация покрытия спектрального
диапазона рабочими параметрами системы. Спектроскопические исследования проведены с помощью ВУФ
спектрометра Джоханновской геометрии. Результаты дают общую информацию о процессах излучения из
ксеноновой, аргоновой и свинцовой плазмы в диапазоне от 12 до 63 нм.
ВУФ- ЕМІСІЙНІ СПЕКТРИ ЗБУДЖЕНИХ Ar, Xe И Sn ІОНІВ, ЗРОБЛЕНИХ У КАПІЛЯРНОМУ
РОЗРЯДІ
K. Новаковська-Лангієр, Л. Якубовський, Є.О. Баронова,
K. Чаус, M. Рабінський, Р. Міровський, M. Якубовський, A. Віражка
Представлено перші результати спостереження емісії вакуумного ультрафіолетового (ВУФ) випромінювання в
плазмі капілярного розряду. Основною метою вимірів була демонстрація покриття спектрального діапазону
робочими параметрами системи. Спектроскопічні дослідження проведені за допомогою ВУФ спектрометра
Джоханнівської геометрії. Результати подають загальну інформацію про процеси випромінювання з ксенонової,
аргонової і свинцевої плазми в діапазоні від 12 до 63 нм.
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