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Plasma streams mixing in two-channel T-shaped magnetic filter
Ti-Al-N films were deposited by vacuum arc method. T-shaped magnetic filter with two channels was used for films preparation. Deposition was performed after aluminum and titanium separate plasma streams from two plasma sources were mixed into single one inside plasma duct having weakened magnetic fi...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2011
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/111691 |
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| Summary: | Ti-Al-N films were deposited by vacuum arc method. T-shaped magnetic filter with two channels was used for films preparation. Deposition was performed after aluminum and titanium separate plasma streams from two plasma sources were mixed into single one inside plasma duct having weakened magnetic field near its output. Obtained films have uniform distribution of composition and thickness on 180 mm diameter substrate surface. It was found that mixing and homogenization degree depends on nitrogen pressure, output magnetic field intensity and output- to-substrate distance. Film self-sputtering and aluminum preferential sputtering were observed for elevated negative substrate bias potentials. |
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