Crystallization kinetics of Ge₂₂Sb₂₂Tе₅₆ doped with Se and Ni
Effects of Ni and Se incorporation on the crystallization kinetics of Ge:Sb:Te alloys have been studied. Both elements were found to increase the stability of the amorphous structure. The kinetics of crystallization under isothermal treatments indicates that Ni reduces both the barrier for thermal c...
Збережено в:
Дата: | 1998 |
---|---|
Автори: | , , , , |
Формат: | Стаття |
Мова: | English |
Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
1998
|
Назва видання: | Semiconductor Physics Quantum Electronics & Optoelectronics |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/114673 |
Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | Crystallization kinetics of Ge₂₂Sb₂₂Tе₅₆ doped with Se and Ni / E. Garsia-Garsia, M. Yanez-Limon, Y. Vorobiev, F. Espinoza-Beltran, J. Gonzalez-Hernandez // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1998. — Т. 1, № 1. — С. 71-74. — Бібліогр.: 8 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of UkraineРезюме: | Effects of Ni and Se incorporation on the crystallization kinetics of Ge:Sb:Te alloys have been studied. Both elements were found to increase the stability of the amorphous structure. The kinetics of crystallization under isothermal treatments indicates that Ni reduces both the barrier for thermal crystallization and the crystallization rate. Crystallization of samples containing Se is also retarded, possibly due to a stronger bonding of this element in comparison with Te. |
---|