Peculiarities of EPR spectra of methyl radicals in quench-condensed krypton films
Methyl radicals are trapped in the solid Kr film by simultaneous condensation of gaseous Kr and the products of the gas discharge in CH₄ doped Kr on the low temperature (4.2 K) substrate located at the center of the microwave cavity. The observed EPR spectrum is a superposition of broad-line and...
Збережено в:
| Дата: | 2008 |
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| Автор: | |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України
2008
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| Назва видання: | Физика низких температур |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/116775 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Peculiarities of EPR spectra of methyl radicals in quench-condensed krypton films / Yu.A. Dmitriev // Физика низких температур. — 2008. — Т. 34, № 1. — С. 95-98. — Бібліогр.: 11 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | Methyl radicals are trapped in the solid Kr film by simultaneous condensation of gaseous Kr and the
products of the gas discharge in CH₄ doped Kr on the low temperature (4.2 K) substrate located at the center
of the microwave cavity. The observed EPR spectrum is a superposition of broad-line and narrow-line series.
At a low resonance microwave power, the latter one consists of four hyperfine components with nearly equal
intensities, and shows small axial anisotropy of both g- and A-tensors. At a sufficiently large power, two central
narrow lines split so that the narrow-line series takes an appearance recorded elsewhere for CH₃ in Ar at
higher temperatures above 12 K. Simultaneously, the intensity of two central broad lines increases dramatically
while the outer components become saturated. The possible explanation is discussed. |
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