X-ray study of dopant state in highly doped semiconductor single crystals

Using Si(As, P, B) and GaSb(Si) study, possibilities of X-ray diffraction methods for diagnostics of highly doped semiconductor crystals in characterization of dopant state – whether it is in the crystals in the form of solid solution or under various stages of its decomposition – are shown. The com...

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Бібліографічні деталі
Дата:2011
Автори: Shul’pina, I.L., Kyutt, R.N., Ratnikov, V.V., Prokhorov, I.A., Bezbakh, I.Zh., Shcheglov, M.P.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/117624
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:X-ray study of dopant state in highly doped semiconductor single crystals / I.L. Shul’pina, R.N. Kyutt, V.V. Ratnikov, I.A. Prokhorov, I.Zh. Bezbakh, M.P. Shcheglov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 62-70. — Бібліогр.: 27 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1176242017-05-26T03:03:51Z X-ray study of dopant state in highly doped semiconductor single crystals Shul’pina, I.L. Kyutt, R.N. Ratnikov, V.V. Prokhorov, I.A. Bezbakh, I.Zh. Shcheglov, M.P. Using Si(As, P, B) and GaSb(Si) study, possibilities of X-ray diffraction methods for diagnostics of highly doped semiconductor crystals in characterization of dopant state – whether it is in the crystals in the form of solid solution or under various stages of its decomposition – are shown. The combination of techniques of X-ray diffraction topography and high resolution X-ray diffractometry, higher sensitive to the crystal lattice strain than that traditionally used is taken as the basis for investigating the crystals with slight and strong absorption of X-rays. These methods were supplemented with digital processing of the topographic images of growth striations and electrical measurements. 2011 Article X-ray study of dopant state in highly doped semiconductor single crystals / I.L. Shul’pina, R.N. Kyutt, V.V. Ratnikov, I.A. Prokhorov, I.Zh. Bezbakh, M.P. Shcheglov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 62-70. — Бібліогр.: 27 назв. — англ. 1560-8034 PACS 61.72.Dd, Ff, Ss; 81.05.Cy, Ea http://dspace.nbuv.gov.ua/handle/123456789/117624 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Using Si(As, P, B) and GaSb(Si) study, possibilities of X-ray diffraction methods for diagnostics of highly doped semiconductor crystals in characterization of dopant state – whether it is in the crystals in the form of solid solution or under various stages of its decomposition – are shown. The combination of techniques of X-ray diffraction topography and high resolution X-ray diffractometry, higher sensitive to the crystal lattice strain than that traditionally used is taken as the basis for investigating the crystals with slight and strong absorption of X-rays. These methods were supplemented with digital processing of the topographic images of growth striations and electrical measurements.
format Article
author Shul’pina, I.L.
Kyutt, R.N.
Ratnikov, V.V.
Prokhorov, I.A.
Bezbakh, I.Zh.
Shcheglov, M.P.
spellingShingle Shul’pina, I.L.
Kyutt, R.N.
Ratnikov, V.V.
Prokhorov, I.A.
Bezbakh, I.Zh.
Shcheglov, M.P.
X-ray study of dopant state in highly doped semiconductor single crystals
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Shul’pina, I.L.
Kyutt, R.N.
Ratnikov, V.V.
Prokhorov, I.A.
Bezbakh, I.Zh.
Shcheglov, M.P.
author_sort Shul’pina, I.L.
title X-ray study of dopant state in highly doped semiconductor single crystals
title_short X-ray study of dopant state in highly doped semiconductor single crystals
title_full X-ray study of dopant state in highly doped semiconductor single crystals
title_fullStr X-ray study of dopant state in highly doped semiconductor single crystals
title_full_unstemmed X-ray study of dopant state in highly doped semiconductor single crystals
title_sort x-ray study of dopant state in highly doped semiconductor single crystals
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2011
url http://dspace.nbuv.gov.ua/handle/123456789/117624
citation_txt X-ray study of dopant state in highly doped semiconductor single crystals / I.L. Shul’pina, R.N. Kyutt, V.V. Ratnikov, I.A. Prokhorov, I.Zh. Bezbakh, M.P. Shcheglov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 62-70. — Бібліогр.: 27 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
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first_indexed 2023-10-18T20:30:14Z
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