Influence of electron-electron drag on piezoresistance of n-Si

Piezoresistance of n-Si is considered with due regard for inter-valley drag. It has been shown that inter-valley drag gains the piezocoefficient and diminishes the mobility. In the region of nondegenerate carriers, the effect of drag increases when the carrier concentration rises and temperature fal...

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Бібліографічні деталі
Дата:2011
Автор: Boiko, I.I.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/117714
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Influence of electron-electron drag on piezoresistance of n-Si / I.I. Boiko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 2. — С. 183-187. — Бібліогр.: 6 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1177142017-05-27T03:05:36Z Influence of electron-electron drag on piezoresistance of n-Si Boiko, I.I. Piezoresistance of n-Si is considered with due regard for inter-valley drag. It has been shown that inter-valley drag gains the piezocoefficient and diminishes the mobility. In the region of nondegenerate carriers, the effect of drag increases when the carrier concentration rises and temperature falls. 2011 Article Influence of electron-electron drag on piezoresistance of n-Si / I.I. Boiko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 2. — С. 183-187. — Бібліогр.: 6 назв. — англ. 1560-8034 PACS 61.72, 72.20 http://dspace.nbuv.gov.ua/handle/123456789/117714 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Piezoresistance of n-Si is considered with due regard for inter-valley drag. It has been shown that inter-valley drag gains the piezocoefficient and diminishes the mobility. In the region of nondegenerate carriers, the effect of drag increases when the carrier concentration rises and temperature falls.
format Article
author Boiko, I.I.
spellingShingle Boiko, I.I.
Influence of electron-electron drag on piezoresistance of n-Si
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Boiko, I.I.
author_sort Boiko, I.I.
title Influence of electron-electron drag on piezoresistance of n-Si
title_short Influence of electron-electron drag on piezoresistance of n-Si
title_full Influence of electron-electron drag on piezoresistance of n-Si
title_fullStr Influence of electron-electron drag on piezoresistance of n-Si
title_full_unstemmed Influence of electron-electron drag on piezoresistance of n-Si
title_sort influence of electron-electron drag on piezoresistance of n-si
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2011
url http://dspace.nbuv.gov.ua/handle/123456789/117714
citation_txt Influence of electron-electron drag on piezoresistance of n-Si / I.I. Boiko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 2. — С. 183-187. — Бібліогр.: 6 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT boikoii influenceofelectronelectrondragonpiezoresistanceofnsi
first_indexed 2023-10-18T20:30:27Z
last_indexed 2023-10-18T20:30:27Z
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