Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate

Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate

The systems “thin Ni film – lithium niobate” and “thin Pd film – lithium tantalate” are implanted by Ar⁺ ions with an energy of 100 keV and a dose of 10¹⁶ cm⁻². Analyses of the systems by AFM and SEM have shown that the ion implantation essentially modifies the near-surface structure resulting in...

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Дата:2007
Автори: Lysiuk, V.O., Staschuk, V.S., Kluy, M.I., Vakulenko, O.V., Poperenko, L.V.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/117919
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate / V.O. Lysiuk, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, L.V. Poperenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 2. — С. 76-80. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1179192017-05-28T03:03:06Z Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate Lysiuk, V.O. Staschuk, V.S. Kluy, M.I. Vakulenko, O.V. Poperenko, L.V. The systems “thin Ni film – lithium niobate” and “thin Pd film – lithium tantalate” are implanted by Ar⁺ ions with an energy of 100 keV and a dose of 10¹⁶ cm⁻². Analyses of the systems by AFM and SEM have shown that the ion implantation essentially modifies the near-surface structure resulting in a change of its optical, electrical, and mechanical properties. Strong difference in the near-surface structures between implanted systems with Ni or Pd thin films is observed. Such a difference is explained by the heterogeneity of an ion beam and different properties of the materials. The application to the development of high-sensitive pyroelectric detectors with high damage threshold is proposed. 2007 Article Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate / V.O. Lysiuk, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, L.V. Poperenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 2. — С. 76-80. — Бібліогр.: 13 назв. — англ. 1560-8034 PACS 68.55.Ln, 85.60.Gz http://dspace.nbuv.gov.ua/handle/123456789/117919 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description The systems “thin Ni film – lithium niobate” and “thin Pd film – lithium tantalate” are implanted by Ar⁺ ions with an energy of 100 keV and a dose of 10¹⁶ cm⁻². Analyses of the systems by AFM and SEM have shown that the ion implantation essentially modifies the near-surface structure resulting in a change of its optical, electrical, and mechanical properties. Strong difference in the near-surface structures between implanted systems with Ni or Pd thin films is observed. Such a difference is explained by the heterogeneity of an ion beam and different properties of the materials. The application to the development of high-sensitive pyroelectric detectors with high damage threshold is proposed.
format Article
author Lysiuk, V.O.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Poperenko, L.V.
spellingShingle Lysiuk, V.O.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Poperenko, L.V.
Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Lysiuk, V.O.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Poperenko, L.V.
author_sort Lysiuk, V.O.
title Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
title_short Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
title_full Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
title_fullStr Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
title_full_unstemmed Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
title_sort influence of ion implantation on the near-surface structure of thin ni and pd films on lithium niobate and lithium tantalate
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2007
url http://dspace.nbuv.gov.ua/handle/123456789/117919
citation_txt Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate / V.O. Lysiuk, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, L.V. Poperenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 2. — С. 76-80. — Бібліогр.: 13 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
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first_indexed 2023-10-18T20:30:55Z
last_indexed 2023-10-18T20:30:55Z
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