Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations

Fractal analysis was used for the description of the geometry of the clusters formed within the Monte Carlo simulation of the first monolayer growth on Si substrate. Pulse laser deposition method was assumed for the epitaxy. Layers were obtained for various substrate temperatures varying in the rang...

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Дата:2003
Автори: Pyziak, L., Obermayr, W., Zembrowska, K., Kuzma, M.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2003
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/118014
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations / L. Pyziak, W. Obermayr, K. Zembrowska, M. Kuzma // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 2. — С. 183-188. — Бібліогр.: 40 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1180142017-05-29T03:05:46Z Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations Pyziak, L. Obermayr, W. Zembrowska, K. Kuzma, M. Fractal analysis was used for the description of the geometry of the clusters formed within the Monte Carlo simulation of the first monolayer growth on Si substrate. Pulse laser deposition method was assumed for the epitaxy. Layers were obtained for various substrate temperatures varying in the range from 600 K to 800 K. The topography of plane clusters formed were characterised by their fractal box-like dimension. The relation between this dimension and the shape of the clusters was addressed. 2003 Article Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations / L. Pyziak, W. Obermayr, K. Zembrowska, M. Kuzma // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 2. — С. 183-188. — Бібліогр.: 40 назв. — англ. 1560-8034 PACS: 02.70.Uu, 61.43.Bn http://dspace.nbuv.gov.ua/handle/123456789/118014 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Fractal analysis was used for the description of the geometry of the clusters formed within the Monte Carlo simulation of the first monolayer growth on Si substrate. Pulse laser deposition method was assumed for the epitaxy. Layers were obtained for various substrate temperatures varying in the range from 600 K to 800 K. The topography of plane clusters formed were characterised by their fractal box-like dimension. The relation between this dimension and the shape of the clusters was addressed.
format Article
author Pyziak, L.
Obermayr, W.
Zembrowska, K.
Kuzma, M.
spellingShingle Pyziak, L.
Obermayr, W.
Zembrowska, K.
Kuzma, M.
Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Pyziak, L.
Obermayr, W.
Zembrowska, K.
Kuzma, M.
author_sort Pyziak, L.
title Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations
title_short Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations
title_full Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations
title_fullStr Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations
title_full_unstemmed Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations
title_sort topography of si epitaxial monolayers obtained on si (001) substrate by computer simulations
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2003
url http://dspace.nbuv.gov.ua/handle/123456789/118014
citation_txt Topography of Si epitaxial monolayers obtained on Si (001) substrate by computer simulations / L. Pyziak, W. Obermayr, K. Zembrowska, M. Kuzma // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 2. — С. 183-188. — Бібліогр.: 40 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT pyziakl topographyofsiepitaxialmonolayersobtainedonsi001substratebycomputersimulations
AT obermayrw topographyofsiepitaxialmonolayersobtainedonsi001substratebycomputersimulations
AT zembrowskak topographyofsiepitaxialmonolayersobtainedonsi001substratebycomputersimulations
AT kuzmam topographyofsiepitaxialmonolayersobtainedonsi001substratebycomputersimulations
first_indexed 2023-10-18T20:31:08Z
last_indexed 2023-10-18T20:31:08Z
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