Vacuum method for creation of liquid crystal orienting microrelief
A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of th...
Збережено в:
| Дата: | 2003 |
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| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2003
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| Назва видання: | Semiconductor Physics Quantum Electronics & Optoelectronics |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/118102 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
irk-123456789-118102 |
|---|---|
| record_format |
dspace |
| spelling |
irk-123456789-1181022017-05-29T03:05:11Z Vacuum method for creation of liquid crystal orienting microrelief Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated. 2003 Article Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. 1560-8034 PACS: 42.79.Kr http://dspace.nbuv.gov.ua/handle/123456789/118102 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| description |
A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated. |
| format |
Article |
| author |
Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| spellingShingle |
Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. Vacuum method for creation of liquid crystal orienting microrelief Semiconductor Physics Quantum Electronics & Optoelectronics |
| author_facet |
Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| author_sort |
Kolomzarov, Yu. |
| title |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_short |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_full |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_fullStr |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_full_unstemmed |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_sort |
vacuum method for creation of liquid crystal orienting microrelief |
| publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| publishDate |
2003 |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/118102 |
| citation_txt |
Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. |
| series |
Semiconductor Physics Quantum Electronics & Optoelectronics |
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| first_indexed |
2023-10-18T20:31:20Z |
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2023-10-18T20:31:20Z |
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1796150420259733504 |