Analysis of methods for high-speed forming the relief microimages on metallic substrates
The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists.
Збережено в:
Дата: | 2007 |
---|---|
Автори: | , , , , |
Формат: | Стаття |
Мова: | English |
Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2007
|
Назва видання: | Semiconductor Physics Quantum Electronics & Optoelectronics |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/118339 |
Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraineid |
irk-123456789-118339 |
---|---|
record_format |
dspace |
spelling |
irk-123456789-1183392017-05-30T03:05:46Z Analysis of methods for high-speed forming the relief microimages on metallic substrates Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists. 2007 Article Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ. 1560-8034 PACS 42.40.Ht, 42.79.Vb, 81.65.Cf http://dspace.nbuv.gov.ua/handle/123456789/118339 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
collection |
DSpace DC |
language |
English |
description |
The use of methods of ion and electrochemical etching of metallic substrates
to obtain relief microstructures with micron and submicron sizes is considered. Presented
are the results of experimental researches of processes aimed at manufacturing metallic
carriers by using inorganic photoresists. |
format |
Article |
author |
Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. |
spellingShingle |
Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. Analysis of methods for high-speed forming the relief microimages on metallic substrates Semiconductor Physics Quantum Electronics & Optoelectronics |
author_facet |
Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. |
author_sort |
Kryuchin, A.A. |
title |
Analysis of methods for high-speed forming the relief microimages on metallic substrates |
title_short |
Analysis of methods for high-speed forming the relief microimages on metallic substrates |
title_full |
Analysis of methods for high-speed forming the relief microimages on metallic substrates |
title_fullStr |
Analysis of methods for high-speed forming the relief microimages on metallic substrates |
title_full_unstemmed |
Analysis of methods for high-speed forming the relief microimages on metallic substrates |
title_sort |
analysis of methods for high-speed forming the relief microimages on metallic substrates |
publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
publishDate |
2007 |
url |
http://dspace.nbuv.gov.ua/handle/123456789/118339 |
citation_txt |
Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ. |
series |
Semiconductor Physics Quantum Electronics & Optoelectronics |
work_keys_str_mv |
AT kryuchinaa analysisofmethodsforhighspeedformingthereliefmicroimagesonmetallicsubstrates AT pankratovaav analysisofmethodsforhighspeedformingthereliefmicroimagesonmetallicsubstrates AT kasskoia analysisofmethodsforhighspeedformingthereliefmicroimagesonmetallicsubstrates AT nagornyfv analysisofmethodsforhighspeedformingthereliefmicroimagesonmetallicsubstrates AT chirkovdv analysisofmethodsforhighspeedformingthereliefmicroimagesonmetallicsubstrates |
first_indexed |
2023-10-18T20:31:57Z |
last_indexed |
2023-10-18T20:31:57Z |
_version_ |
1796150447107473408 |