Analysis of methods for high-speed forming the relief microimages on metallic substrates

The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists.

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Бібліографічні деталі
Дата:2007
Автори: Kryuchin, A.A., Pankratova, A.V., Kassko, I.A., Nagorny, F.V., Chirkov, D.V.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/118339
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1183392017-05-30T03:05:46Z Analysis of methods for high-speed forming the relief microimages on metallic substrates Kryuchin, A.A. Pankratova, A.V. Kassko, I.A. Nagorny, F.V. Chirkov, D.V. The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists. 2007 Article Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ. 1560-8034 PACS 42.40.Ht, 42.79.Vb, 81.65.Cf http://dspace.nbuv.gov.ua/handle/123456789/118339 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists.
format Article
author Kryuchin, A.A.
Pankratova, A.V.
Kassko, I.A.
Nagorny, F.V.
Chirkov, D.V.
spellingShingle Kryuchin, A.A.
Pankratova, A.V.
Kassko, I.A.
Nagorny, F.V.
Chirkov, D.V.
Analysis of methods for high-speed forming the relief microimages on metallic substrates
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Kryuchin, A.A.
Pankratova, A.V.
Kassko, I.A.
Nagorny, F.V.
Chirkov, D.V.
author_sort Kryuchin, A.A.
title Analysis of methods for high-speed forming the relief microimages on metallic substrates
title_short Analysis of methods for high-speed forming the relief microimages on metallic substrates
title_full Analysis of methods for high-speed forming the relief microimages on metallic substrates
title_fullStr Analysis of methods for high-speed forming the relief microimages on metallic substrates
title_full_unstemmed Analysis of methods for high-speed forming the relief microimages on metallic substrates
title_sort analysis of methods for high-speed forming the relief microimages on metallic substrates
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2007
url http://dspace.nbuv.gov.ua/handle/123456789/118339
citation_txt Analysis of methods for high-speed forming the relief microimages on metallic substrates / A.A. Kryuchin, A.V. Pankratova, I.A. Kassko, F.V.Nagorny, D.V.Chirkov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 87-93. — Бібліогр.: 17 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
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AT nagornyfv analysisofmethodsforhighspeedformingthereliefmicroimagesonmetallicsubstrates
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first_indexed 2023-10-18T20:31:57Z
last_indexed 2023-10-18T20:31:57Z
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