High-density data recording via laser thermo-lithography and ion-beam etching
Pits 250 – 300 - nm wide were obtained on the surface of thin organic nanocomposite film using master-disc laser-burning station with 405 nm laser beam focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent reactive ion-beam etching of glass substrate. Finally, 150...
Збережено в:
| Дата: | 2014 |
|---|---|
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2014
|
| Назва видання: | Semiconductor Physics Quantum Electronics & Optoelectronics |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/118350 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | High-density data recording via laser thermo-lithography and ion-beam etching / I.V. Gorbov, A.A. Kryuchyn, K.P. Grytsenko, D.Yu. Manko, Yu.O. Borodin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 52-55. — Бібліогр.: 7 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
irk-123456789-118350 |
|---|---|
| record_format |
dspace |
| spelling |
irk-123456789-1183502017-05-31T03:04:47Z High-density data recording via laser thermo-lithography and ion-beam etching Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. Pits 250 – 300 - nm wide were obtained on the surface of thin organic nanocomposite film using master-disc laser-burning station with 405 nm laser beam focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent reactive ion-beam etching of glass substrate. Finally, 150 – 200-nm pits were performed on the substrate surface. Nanocomposite films were based on organic positive photoresist with a dye inclusions. This dye is characterized by wide absorption band within the spectral region 390–410 nm and can be evaporated by laser irradiation with the wavelength 405 nm 2014 Article High-density data recording via laser thermo-lithography and ion-beam etching / I.V. Gorbov, A.A. Kryuchyn, K.P. Grytsenko, D.Yu. Manko, Yu.O. Borodin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 52-55. — Бібліогр.: 7 назв. — англ. 1560-8034 PACS 81.16.Nd http://dspace.nbuv.gov.ua/handle/123456789/118350 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| description |
Pits 250 – 300 - nm wide were obtained on the surface of thin organic
nanocomposite film using master-disc laser-burning station with 405 nm laser beam
focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent
reactive ion-beam etching of glass substrate. Finally, 150 – 200-nm pits were performed
on the substrate surface. Nanocomposite films were based on organic positive photoresist
with a dye inclusions. This dye is characterized by wide absorption band within the
spectral region 390–410 nm and can be evaporated by laser irradiation with the
wavelength 405 nm |
| format |
Article |
| author |
Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. |
| spellingShingle |
Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. High-density data recording via laser thermo-lithography and ion-beam etching Semiconductor Physics Quantum Electronics & Optoelectronics |
| author_facet |
Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. |
| author_sort |
Gorbov, I.V. |
| title |
High-density data recording via laser thermo-lithography and ion-beam etching |
| title_short |
High-density data recording via laser thermo-lithography and ion-beam etching |
| title_full |
High-density data recording via laser thermo-lithography and ion-beam etching |
| title_fullStr |
High-density data recording via laser thermo-lithography and ion-beam etching |
| title_full_unstemmed |
High-density data recording via laser thermo-lithography and ion-beam etching |
| title_sort |
high-density data recording via laser thermo-lithography and ion-beam etching |
| publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| publishDate |
2014 |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/118350 |
| citation_txt |
High-density data recording via laser thermo-lithography
and ion-beam etching / I.V. Gorbov, A.A. Kryuchyn, K.P. Grytsenko, D.Yu. Manko, Yu.O. Borodin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 52-55. — Бібліогр.: 7 назв. — англ. |
| series |
Semiconductor Physics Quantum Electronics & Optoelectronics |
| work_keys_str_mv |
AT gorboviv highdensitydatarecordingvialaserthermolithographyandionbeametching AT kryuchynaa highdensitydatarecordingvialaserthermolithographyandionbeametching AT grytsenkokp highdensitydatarecordingvialaserthermolithographyandionbeametching AT mankodyu highdensitydatarecordingvialaserthermolithographyandionbeametching AT borodinyuo highdensitydatarecordingvialaserthermolithographyandionbeametching |
| first_indexed |
2023-10-18T20:31:46Z |
| last_indexed |
2023-10-18T20:31:46Z |
| _version_ |
1796150443165876224 |