Modification of optical properties and structure of thin films for enhancing absorption

The most used methods such as ion implantation, laser irradiation and nanosphere lithography for modification and creation of special microrelief of thin absorbing films on photosensitive substrates have been described. Controlled modification of surface structure of the samples for improving the...

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Бібліографічні деталі
Дата:2014
Автор: Lysiuk, V.O.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/118375
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Modification of optical properties and structure of thin films for enhancing absorption / V.O. Lysiuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 209-212. — Бібліогр.: 14 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-118375
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spelling irk-123456789-1183752017-05-31T03:05:54Z Modification of optical properties and structure of thin films for enhancing absorption Lysiuk, V.O. The most used methods such as ion implantation, laser irradiation and nanosphere lithography for modification and creation of special microrelief of thin absorbing films on photosensitive substrates have been described. Controlled modification of surface structure of the samples for improving their optical properties, especially for enhancing absorption, has many applications in optical devices. The basic things were analyzed from selection of film materials and ways for their further processing to shapes and dimensions of the obtained surface structures. Theoretical modeling methods based on the Mie theory and statistical temporal mode-coupled theory have been used to explain the influence of surface microrelief on optical properties of the samples. Advantages and perspectives for application of the methods have been described and analyzed. 2014 Article Modification of optical properties and structure of thin films for enhancing absorption / V.O. Lysiuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 209-212. — Бібліогр.: 14 назв. — англ. 1560-8034 PACS 78.20.-e, 81.65.-b http://dspace.nbuv.gov.ua/handle/123456789/118375 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description The most used methods such as ion implantation, laser irradiation and nanosphere lithography for modification and creation of special microrelief of thin absorbing films on photosensitive substrates have been described. Controlled modification of surface structure of the samples for improving their optical properties, especially for enhancing absorption, has many applications in optical devices. The basic things were analyzed from selection of film materials and ways for their further processing to shapes and dimensions of the obtained surface structures. Theoretical modeling methods based on the Mie theory and statistical temporal mode-coupled theory have been used to explain the influence of surface microrelief on optical properties of the samples. Advantages and perspectives for application of the methods have been described and analyzed.
format Article
author Lysiuk, V.O.
spellingShingle Lysiuk, V.O.
Modification of optical properties and structure of thin films for enhancing absorption
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Lysiuk, V.O.
author_sort Lysiuk, V.O.
title Modification of optical properties and structure of thin films for enhancing absorption
title_short Modification of optical properties and structure of thin films for enhancing absorption
title_full Modification of optical properties and structure of thin films for enhancing absorption
title_fullStr Modification of optical properties and structure of thin films for enhancing absorption
title_full_unstemmed Modification of optical properties and structure of thin films for enhancing absorption
title_sort modification of optical properties and structure of thin films for enhancing absorption
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2014
url http://dspace.nbuv.gov.ua/handle/123456789/118375
citation_txt Modification of optical properties and structure of thin films for enhancing absorption / V.O. Lysiuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 2. — С. 209-212. — Бібліогр.: 14 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT lysiukvo modificationofopticalpropertiesandstructureofthinfilmsforenhancingabsorption
first_indexed 2023-10-18T20:31:59Z
last_indexed 2023-10-18T20:31:59Z
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