Influence of solution precursors on structure of ZnO films

In the work using high resolution scanning electron microscopy and X-ray analysis, we carry out the studying of the correlation between chemical and technological conditions of deposition, the initial solution composition and structural properties of the synthesized samples of zinc oxide. Growth of...

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Збережено в:
Бібліографічні деталі
Дата:2015
Автори: Berestok, T.O., Kurbatov, D.I., Opanasyuk, N.M., Opanasyuk, A.S.
Формат: Стаття
Мова:English
Опубліковано: НТК «Інститут монокристалів» НАН України 2015
Назва видання:Functional Materials
Теми:
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/119303
Теги: Додати тег
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Influence of solution precursors on structure of ZnO films / T.O. Berestok, D.I. Kurbatov, N.M. Opanasyuk, A.S. Opanasyuk // Functional Materials. — 2015. — Т. 22, № 1. — С. 93-99. — Бібліогр.: 25 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
Опис
Резюме:In the work using high resolution scanning electron microscopy and X-ray analysis, we carry out the studying of the correlation between chemical and technological conditions of deposition, the initial solution composition and structural properties of the synthesized samples of zinc oxide. Growth of the layers depends on the initial precursors and it occurs through formation of the ordered array of nanorods and nanoflowers. It is shown that it is possible to choose the optimal conditions to obtain ZnO films with controlled structural properties that can be used as the base layers in microelectronic devices.