Investigation of ArF* excimer laser VUV radiation action on sapphire

Aluminium components of products escaped from the surface of a sapphire target being illuminated by VUV emission of an ArF* laser are investigated using the method of laser-induced fluorescence combined with the transient time technique. Relative concentrations of aluminium atoms and ions as well as...

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Бібліографічні деталі
Дата:2001
Автори: Baschenko, S.M., Gochelashvili, K.S., Zakirov, R.M., Klimov, V.I., Mikhkelsoo, V.T., Prokhorov, O.M.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2001
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/119330
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Investigation of ArF* excimer laser VUV radiation action on sapphire / S.M. Baschenko, K.S. Gochelashvili, R.M. Zakirov, V.I. Klimov, V.T. Mikhkelsoo, O.M. Prokhorov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 290-297. — Бібліогр.: 14 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1193302017-06-07T03:02:53Z Investigation of ArF* excimer laser VUV radiation action on sapphire Baschenko, S.M. Gochelashvili, K.S. Zakirov, R.M. Klimov, V.I. Mikhkelsoo, V.T. Prokhorov, O.M. Aluminium components of products escaped from the surface of a sapphire target being illuminated by VUV emission of an ArF* laser are investigated using the method of laser-induced fluorescence combined with the transient time technique. Relative concentrations of aluminium atoms and ions as well as their distribution on velocities in the flow are measured. Determined is also the temperature and velocity of aluminium atoms. It is ascertained that within the range of used energy densities of 0.45 to 1.0 J/cm² extraction of materials can be made in three regimes, namely: the ablation, the plasma and mixed ones, intertransitions between them being of a cyclic character. 2001 Article Investigation of ArF* excimer laser VUV radiation action on sapphire / S.M. Baschenko, K.S. Gochelashvili, R.M. Zakirov, V.I. Klimov, V.T. Mikhkelsoo, O.M. Prokhorov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 290-297. — Бібліогр.: 14 назв. — англ. 1560-8034 PACS: 32.50; 42.55.L; 79.20.D http://dspace.nbuv.gov.ua/handle/123456789/119330 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Aluminium components of products escaped from the surface of a sapphire target being illuminated by VUV emission of an ArF* laser are investigated using the method of laser-induced fluorescence combined with the transient time technique. Relative concentrations of aluminium atoms and ions as well as their distribution on velocities in the flow are measured. Determined is also the temperature and velocity of aluminium atoms. It is ascertained that within the range of used energy densities of 0.45 to 1.0 J/cm² extraction of materials can be made in three regimes, namely: the ablation, the plasma and mixed ones, intertransitions between them being of a cyclic character.
format Article
author Baschenko, S.M.
Gochelashvili, K.S.
Zakirov, R.M.
Klimov, V.I.
Mikhkelsoo, V.T.
Prokhorov, O.M.
spellingShingle Baschenko, S.M.
Gochelashvili, K.S.
Zakirov, R.M.
Klimov, V.I.
Mikhkelsoo, V.T.
Prokhorov, O.M.
Investigation of ArF* excimer laser VUV radiation action on sapphire
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Baschenko, S.M.
Gochelashvili, K.S.
Zakirov, R.M.
Klimov, V.I.
Mikhkelsoo, V.T.
Prokhorov, O.M.
author_sort Baschenko, S.M.
title Investigation of ArF* excimer laser VUV radiation action on sapphire
title_short Investigation of ArF* excimer laser VUV radiation action on sapphire
title_full Investigation of ArF* excimer laser VUV radiation action on sapphire
title_fullStr Investigation of ArF* excimer laser VUV radiation action on sapphire
title_full_unstemmed Investigation of ArF* excimer laser VUV radiation action on sapphire
title_sort investigation of arf* excimer laser vuv radiation action on sapphire
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2001
url http://dspace.nbuv.gov.ua/handle/123456789/119330
citation_txt Investigation of ArF* excimer laser VUV radiation action on sapphire / S.M. Baschenko, K.S. Gochelashvili, R.M. Zakirov, V.I. Klimov, V.T. Mikhkelsoo, O.M. Prokhorov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 4. — С. 290-297. — Бібліогр.: 14 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
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first_indexed 2023-10-18T20:34:18Z
last_indexed 2023-10-18T20:34:18Z
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