The influence of defects and conductivity on the domain structure properties and the memory effect in the ferroelectrics-semiconductors Sn₂P₂Se₆

For the proper uniaxial ferroelectrics Sn₂P₂Se₆ with the controlled content of different type of impurities the investigations of dielectric permeability temperature dependence are performed with the aim to determine the influence of the crystal structure defects upon: the efficiency of the thermal...

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Збережено в:
Бібліографічні деталі
Дата:1999
Автори: Vysochanskii, Yu.M., Molnar, A.A., Khoma, M.M., Motrja, S.F.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики конденсованих систем НАН України 1999
Назва видання:Condensed Matter Physics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/120525
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:The influence of defects and conductivity on the domain structure properties and the memory effect in the ferroelectrics-semiconductors Sn₂P₂Se₆ / Yu.M. Vysochanskii, A.A. Molnar, M.M. Khoma, S.F. Motrja // Condensed Matter Physics. — 1999. — Т. 2, № 3(19). — С. 421-434. — Бібліогр.: 24 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Опис
Резюме:For the proper uniaxial ferroelectrics Sn₂P₂Se₆ with the controlled content of different type of impurities the investigations of dielectric permeability temperature dependence are performed with the aim to determine the influence of the crystal structure defects upon: the efficiency of the thermal memory effect recording in the incommensurate (IC) phase; the second order phase transition (PT) from the paraelectric phase to the IC phase at temperature Ti and upon the first order PT from IC phase to ferroelectric phase at temperature Tc; the anomalous hysteresis of the dielectric properties temperature dependence in the IC phase; the dielectric contribution of the domain walls in the ferroelectric phase. Static defects smear the anomaly at the PT from paraelectric phase to IC phase, increase the anomalous hysteresis in the IC phase and the hysteresis of the lock-in transition temperature Tc, suppress the dielectric contribution of domain walls in the ferroelectric phase and destroy the memory effect in the IC phase. The increase of the charge carrier concentration also suppresses the dielectric output of the domain walls in the ferroelectric phase but at the same time it supports a more clear memory recording in the IC phase. Such a tendency agrees with the estimations in the mean-field approximation for the characteristics of a domain structure in the ferroelectric phase and memory effect in the IC phase in the ferroelectrics-semiconductors investigated.