The influence of defects and conductivity on the domain structure properties and the memory effect in the ferroelectrics-semiconductors Sn₂P₂Se₆
For the proper uniaxial ferroelectrics Sn₂P₂Se₆ with the controlled content of different type of impurities the investigations of dielectric permeability temperature dependence are performed with the aim to determine the influence of the crystal structure defects upon: the efficiency of the thermal...
Збережено в:
Дата: | 1999 |
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Автори: | , , , |
Формат: | Стаття |
Мова: | English |
Опубліковано: |
Інститут фізики конденсованих систем НАН України
1999
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Назва видання: | Condensed Matter Physics |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/120525 |
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Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | The influence of defects and conductivity on the domain structure properties and the memory effect in the ferroelectrics-semiconductors Sn₂P₂Se₆ / Yu.M. Vysochanskii, A.A. Molnar, M.M. Khoma, S.F. Motrja // Condensed Matter Physics. — 1999. — Т. 2, № 3(19). — С. 421-434. — Бібліогр.: 24 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of UkraineРезюме: | For the proper uniaxial ferroelectrics Sn₂P₂Se₆ with the controlled content
of different type of impurities the investigations of dielectric permeability
temperature dependence are performed with the aim to determine the influence of the crystal structure defects upon: the efficiency of the thermal
memory effect recording in the incommensurate (IC) phase; the second
order phase transition (PT) from the paraelectric phase to the IC phase
at temperature Ti and upon the first order PT from IC phase to ferroelectric phase at temperature Tc; the anomalous hysteresis of the dielectric
properties temperature dependence in the IC phase; the dielectric contribution of the domain walls in the ferroelectric phase. Static defects smear
the anomaly at the PT from paraelectric phase to IC phase, increase the
anomalous hysteresis in the IC phase and the hysteresis of the lock-in
transition temperature Tc, suppress the dielectric contribution of domain
walls in the ferroelectric phase and destroy the memory effect in the IC
phase. The increase of the charge carrier concentration also suppresses
the dielectric output of the domain walls in the ferroelectric phase but at
the same time it supports a more clear memory recording in the IC phase.
Such a tendency agrees with the estimations in the mean-field approximation for the characteristics of a domain structure in the ferroelectric phase
and memory effect in the IC phase in the ferroelectrics-semiconductors investigated. |
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