Physico-Chemical model and computer simulations of silicon nanowire growth

A model of catalytically enhanced CVD growth of a silicon nanowire assembly on a substrate is developed, and growth process is simulated. Thermodynamic-kinetic theory is used for modeling of molecular transport in the gas phase, processes near catalyst surface and nanowire side of variable curvature...

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Видавець:Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Дата:2005
Автори: Efremov, A., Klimovskaya, A., Kamins, T., Shanina, B., Grygoryev, K ., Lukyanets, S .
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2005
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/120978
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Цитувати:Physico-Chemical model and computer simulations of silicon nanowire growth / A. Efremov, A. Klimovskaya, T. Kamins, B. Shanina, K. Grygoryev, S. Lukyanets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 1-11. — Бібліогр.: 37 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-120978
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spelling irk-123456789-1209782017-06-14T03:03:57Z Physico-Chemical model and computer simulations of silicon nanowire growth Efremov, A. Klimovskaya, A. Kamins, T. Shanina, B. Grygoryev, K . Lukyanets, S . A model of catalytically enhanced CVD growth of a silicon nanowire assembly on a substrate is developed, and growth process is simulated. Thermodynamic-kinetic theory is used for modeling of molecular transport in the gas phase, processes near catalyst surface and nanowire side of variable curvature, bulk diffusion of silicon adatoms through catalyst – body, and 2D nucleation. The simulation of atomic transport across surfaces is based on a long-wave approach of lattice gas approximation. To determine a character of atomic transport in TiSi₂-catalyst that is of great importance for application in Si-based technology, a density functional theory is used. The main result of modeling is that it is found a relationship between growth conditions (an initial radius of catalyst particles, their density, substrate temperature, content, pressure of gas, as well as properties of materials used) and, on the other hand, a growth rate, shape, composition, and type of atomic structure (amorphous or crystalline) of the nanowires grown. Besides, available experimental data published previously are discussed, and a qualitative agreement between theory and various experiments is obtained. This agreement gives rise to use the found relationship for controlling the nanowire growth. 2005 Article Physico-Chemical model and computer simulations of silicon nanowire growth / A. Efremov, A. Klimovskaya, T. Kamins, B. Shanina, K. Grygoryev, S. Lukyanets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 1-11. — Бібліогр.: 37 назв. — англ. 1560-8034 PACS: 68.70.+w, 81.10.-h, 81.15.Aa, 64.60.Qb http://dspace.nbuv.gov.ua/handle/123456789/120978 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description A model of catalytically enhanced CVD growth of a silicon nanowire assembly on a substrate is developed, and growth process is simulated. Thermodynamic-kinetic theory is used for modeling of molecular transport in the gas phase, processes near catalyst surface and nanowire side of variable curvature, bulk diffusion of silicon adatoms through catalyst – body, and 2D nucleation. The simulation of atomic transport across surfaces is based on a long-wave approach of lattice gas approximation. To determine a character of atomic transport in TiSi₂-catalyst that is of great importance for application in Si-based technology, a density functional theory is used. The main result of modeling is that it is found a relationship between growth conditions (an initial radius of catalyst particles, their density, substrate temperature, content, pressure of gas, as well as properties of materials used) and, on the other hand, a growth rate, shape, composition, and type of atomic structure (amorphous or crystalline) of the nanowires grown. Besides, available experimental data published previously are discussed, and a qualitative agreement between theory and various experiments is obtained. This agreement gives rise to use the found relationship for controlling the nanowire growth.
format Article
author Efremov, A.
Klimovskaya, A.
Kamins, T.
Shanina, B.
Grygoryev, K .
Lukyanets, S .
spellingShingle Efremov, A.
Klimovskaya, A.
Kamins, T.
Shanina, B.
Grygoryev, K .
Lukyanets, S .
Physico-Chemical model and computer simulations of silicon nanowire growth
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Efremov, A.
Klimovskaya, A.
Kamins, T.
Shanina, B.
Grygoryev, K .
Lukyanets, S .
author_sort Efremov, A.
title Physico-Chemical model and computer simulations of silicon nanowire growth
title_short Physico-Chemical model and computer simulations of silicon nanowire growth
title_full Physico-Chemical model and computer simulations of silicon nanowire growth
title_fullStr Physico-Chemical model and computer simulations of silicon nanowire growth
title_full_unstemmed Physico-Chemical model and computer simulations of silicon nanowire growth
title_sort physico-chemical model and computer simulations of silicon nanowire growth
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2005
url http://dspace.nbuv.gov.ua/handle/123456789/120978
citation_txt Physico-Chemical model and computer simulations of silicon nanowire growth / A. Efremov, A. Klimovskaya, T. Kamins, B. Shanina, K. Grygoryev, S. Lukyanets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2005. — Т. 8, № 3. — С. 1-11. — Бібліогр.: 37 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
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AT shaninab physicochemicalmodelandcomputersimulationsofsiliconnanowiregrowth
AT grygoryevk physicochemicalmodelandcomputersimulationsofsiliconnanowiregrowth
AT lukyanetss physicochemicalmodelandcomputersimulationsofsiliconnanowiregrowth
first_indexed 2023-10-18T20:38:33Z
last_indexed 2023-10-18T20:38:33Z
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