Multiwave laser source for simultaneous sounding ozone and critically related to ozone chemicals

The scheme of multiwave laser source, suitable for simultaneous probing ozone and chemicals critically related to ozone (such as HCl, ClONO₂, N₂O₅, HNO₃) participating in its formation and destruction, when using differential absorption with scattering method (DIAS) for sounding, is suggested. Such...

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Збережено в:
Бібліографічні деталі
Дата:2000
Автор: Baschenko, S.M.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2000
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/121095
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Multiwave laser source for simultaneous sounding ozone and critically related to ozone chemicals / S.M. Baschenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 2. — С. 244-246. — Бібліогр.: 5 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Резюме:The scheme of multiwave laser source, suitable for simultaneous probing ozone and chemicals critically related to ozone (such as HCl, ClONO₂, N₂O₅, HNO₃) participating in its formation and destruction, when using differential absorption with scattering method (DIAS) for sounding, is suggested. Such a source may consist of excimer laser complex complemented with a converter implementing Stimulated Raman Scattering phenomena. Both complex and converter are assembled and operate using “oscillator-amplifier” optical scheme, which provides simultaneous generation at few wavelengths in a wide spectral range due to discrete Raman conversion with its fine tuning due to complex implementation. Experimental pattern of 3-waves laser source elaborated with this scheme is described. In our attempt laser source consists of XeCl*-excimer laser complex supplemented with SRS-converter with dense hydrogen. Possibilities of simultaneous generation at three lines - 308, 353 nm and one of the wide set: 414, 499, 635 or 855 nm – with fine tuning of all lines within up to 1 nm are demonstrated. The advantages of offered scheme and difficulties in its realization are discussed.