Metal-dielectric black matrix for display devices

Technology of metal-dielectric coating deposition for manufacturing a light-absorbing black matrix on a panel of color cathode-ray tubes is described. The coating is prepared using thermo-vacuum evaporation of SiO-Cr mixture. That yields in a thin-layer non-uniform (by its composition) structure SiO...

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Дата:2000
Автори: Chang Won Park, Joon-Bae Lee, Young Rag Do, Shepeliavyi, P., Michailovska, K., Indutnyy, I., Kudryavtsev, O.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2000
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/121226
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Metal-dielectric black matrix for display devices / Chang Won Park, Joon-Bae Lee, Young Rag Do, P. Shepeliavyi, K. Michailovs'ka, I. Indutnyy, O. Kudryavtsev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 4. — С. 496-499. — Бібліогр.: 6 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1212262017-06-14T03:07:43Z Metal-dielectric black matrix for display devices Chang Won Park Joon-Bae Lee Young Rag Do Shepeliavyi, P. Michailovska, K. Indutnyy, I. Kudryavtsev, O. Technology of metal-dielectric coating deposition for manufacturing a light-absorbing black matrix on a panel of color cathode-ray tubes is described. The coating is prepared using thermo-vacuum evaporation of SiO-Cr mixture. That yields in a thin-layer non-uniform (by its composition) structure SiOx-Cr. It is shown that the coating prepared in this way is achromatic and has low reflectivity (~1%) from the side of a transparent panel. The index of diffuse light scattering measured for such metal-dielectric coating does not exceed 0.1% in the spectral range of 400-700 nm. It is shown that black matrix based on the coating SiOx-Cr can be produced using the methods of direct or lift-off photolithography, with organic or non-organic photoresist. Color CRT with these metal-dielectric black matrixes on their panels have increased image contrast as compared with the colloid-graphite ones. 2000 Article Metal-dielectric black matrix for display devices / Chang Won Park, Joon-Bae Lee, Young Rag Do, P. Shepeliavyi, K. Michailovs'ka, I. Indutnyy, O. Kudryavtsev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 4. — С. 496-499. — Бібліогр.: 6 назв. — англ. 1560-8034 PACS: 42.79.K, 85.40.H http://dspace.nbuv.gov.ua/handle/123456789/121226 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Technology of metal-dielectric coating deposition for manufacturing a light-absorbing black matrix on a panel of color cathode-ray tubes is described. The coating is prepared using thermo-vacuum evaporation of SiO-Cr mixture. That yields in a thin-layer non-uniform (by its composition) structure SiOx-Cr. It is shown that the coating prepared in this way is achromatic and has low reflectivity (~1%) from the side of a transparent panel. The index of diffuse light scattering measured for such metal-dielectric coating does not exceed 0.1% in the spectral range of 400-700 nm. It is shown that black matrix based on the coating SiOx-Cr can be produced using the methods of direct or lift-off photolithography, with organic or non-organic photoresist. Color CRT with these metal-dielectric black matrixes on their panels have increased image contrast as compared with the colloid-graphite ones.
format Article
author Chang Won Park
Joon-Bae Lee
Young Rag Do
Shepeliavyi, P.
Michailovska, K.
Indutnyy, I.
Kudryavtsev, O.
spellingShingle Chang Won Park
Joon-Bae Lee
Young Rag Do
Shepeliavyi, P.
Michailovska, K.
Indutnyy, I.
Kudryavtsev, O.
Metal-dielectric black matrix for display devices
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Chang Won Park
Joon-Bae Lee
Young Rag Do
Shepeliavyi, P.
Michailovska, K.
Indutnyy, I.
Kudryavtsev, O.
author_sort Chang Won Park
title Metal-dielectric black matrix for display devices
title_short Metal-dielectric black matrix for display devices
title_full Metal-dielectric black matrix for display devices
title_fullStr Metal-dielectric black matrix for display devices
title_full_unstemmed Metal-dielectric black matrix for display devices
title_sort metal-dielectric black matrix for display devices
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2000
url http://dspace.nbuv.gov.ua/handle/123456789/121226
citation_txt Metal-dielectric black matrix for display devices / Chang Won Park, Joon-Bae Lee, Young Rag Do, P. Shepeliavyi, K. Michailovs'ka, I. Indutnyy, O. Kudryavtsev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2000. — Т. 3, № 4. — С. 496-499. — Бібліогр.: 6 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
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AT michailovskak metaldielectricblackmatrixfordisplaydevices
AT indutnyyi metaldielectricblackmatrixfordisplaydevices
AT kudryavtsevo metaldielectricblackmatrixfordisplaydevices
first_indexed 2023-10-18T20:38:56Z
last_indexed 2023-10-18T20:38:56Z
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