Speckle pattern formation in spatially limited optical systems

The dependences of statistical parameters inherent to speckle patterns on the object roughness and aperture size have been investigated. The experimental results that confirm theoretical dependence quality within the limits of errors were obtained. It has been shown that spatial finiteness of the op...

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Видавець:Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Дата:2016
Автори: Kotov, M.M., Kurashov, V.N., Goloborodko, A.A.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2016
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/121530
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Цитувати:Speckle pattern formation in spatially limited optical systems / M.M. Kotov, V.N. Kurashov, A.A. Goloborodko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 47-51. — Бібліогр.: 7 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-121530
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spelling irk-123456789-1215302017-06-15T03:05:43Z Speckle pattern formation in spatially limited optical systems Kotov, M.M. Kurashov, V.N. Goloborodko, A.A. The dependences of statistical parameters inherent to speckle patterns on the object roughness and aperture size have been investigated. The experimental results that confirm theoretical dependence quality within the limits of errors were obtained. It has been shown that spatial finiteness of the optical system causes significant changes of transferred field. 2016 Article Speckle pattern formation in spatially limited optical systems / M.M. Kotov, V.N. Kurashov, A.A. Goloborodko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 47-51. — Бібліогр.: 7 назв. — англ. 1560-8034 DOI: 10.15407/spqeo19.01.047 PACS 42.15.Dp, 42.25.Dd, 42.25.Fx, 42.30.Ms http://dspace.nbuv.gov.ua/handle/123456789/121530 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description The dependences of statistical parameters inherent to speckle patterns on the object roughness and aperture size have been investigated. The experimental results that confirm theoretical dependence quality within the limits of errors were obtained. It has been shown that spatial finiteness of the optical system causes significant changes of transferred field.
format Article
author Kotov, M.M.
Kurashov, V.N.
Goloborodko, A.A.
spellingShingle Kotov, M.M.
Kurashov, V.N.
Goloborodko, A.A.
Speckle pattern formation in spatially limited optical systems
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Kotov, M.M.
Kurashov, V.N.
Goloborodko, A.A.
author_sort Kotov, M.M.
title Speckle pattern formation in spatially limited optical systems
title_short Speckle pattern formation in spatially limited optical systems
title_full Speckle pattern formation in spatially limited optical systems
title_fullStr Speckle pattern formation in spatially limited optical systems
title_full_unstemmed Speckle pattern formation in spatially limited optical systems
title_sort speckle pattern formation in spatially limited optical systems
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2016
url http://dspace.nbuv.gov.ua/handle/123456789/121530
citation_txt Speckle pattern formation in spatially limited optical systems / M.M. Kotov, V.N. Kurashov, A.A. Goloborodko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2016. — Т. 19, № 1. — С. 47-51. — Бібліогр.: 7 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT kotovmm specklepatternformationinspatiallylimitedopticalsystems
AT kurashovvn specklepatternformationinspatiallylimitedopticalsystems
AT goloborodkoaa specklepatternformationinspatiallylimitedopticalsystems
first_indexed 2023-10-18T20:39:46Z
last_indexed 2023-10-18T20:39:46Z
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