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Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique
New nanocomposite compounds containing alternating layers of molybdenum disulfide and organic compound (dyes, polyvinyl alcohol) have been synthesized using sigle-layer dispersions obtained by exfoliation of bulk MoS₂ crystals. The formation mechanism of those compounds as weel as their structure ar...
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НТК «Інститут монокристалів» НАН України
2006
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Series: | Functional Materials |
Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/135030 |
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irk-123456789-1350302018-06-15T03:04:08Z Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique Golub, A.S. Lenenko, N.D. Novikov, Yu.N. Rumyantsev, B.M. Bibikov, S.B. Zhuravleva, T.S. New nanocomposite compounds containing alternating layers of molybdenum disulfide and organic compound (dyes, polyvinyl alcohol) have been synthesized using sigle-layer dispersions obtained by exfoliation of bulk MoS₂ crystals. The formation mechanism of those compounds as weel as their structure are discussed. The data on photoelectric sensitivity of the system consisting of MoS₂-polyvinyl alcohol nanocomposite and some photoconductive polymers are reported. 2006 Article Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique / A.S. Golub, N.D. Lenenko, Yu.N. Novikov, B.M. Rumyantsev, S.B. Bibikov, T.S. Zhuravleva // Functional Materials. — 2006. — Т. 13, № 3. — С. 502-506. — Бібліогр.: 11 назв. — англ. 1027-5495 http://dspace.nbuv.gov.ua/handle/123456789/135030 en Functional Materials НТК «Інститут монокристалів» НАН України |
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New nanocomposite compounds containing alternating layers of molybdenum disulfide and organic compound (dyes, polyvinyl alcohol) have been synthesized using sigle-layer dispersions obtained by exfoliation of bulk MoS₂ crystals. The formation mechanism of those compounds as weel as their structure are discussed. The data on photoelectric sensitivity of the system consisting of MoS₂-polyvinyl alcohol nanocomposite and some photoconductive polymers are reported. |
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Article |
author |
Golub, A.S. Lenenko, N.D. Novikov, Yu.N. Rumyantsev, B.M. Bibikov, S.B. Zhuravleva, T.S. |
spellingShingle |
Golub, A.S. Lenenko, N.D. Novikov, Yu.N. Rumyantsev, B.M. Bibikov, S.B. Zhuravleva, T.S. Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique Functional Materials |
author_facet |
Golub, A.S. Lenenko, N.D. Novikov, Yu.N. Rumyantsev, B.M. Bibikov, S.B. Zhuravleva, T.S. |
author_sort |
Golub, A.S. |
title |
Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique |
title_short |
Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique |
title_full |
Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique |
title_fullStr |
Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique |
title_full_unstemmed |
Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique |
title_sort |
assembling of mos₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique |
publisher |
НТК «Інститут монокристалів» НАН України |
publishDate |
2006 |
url |
http://dspace.nbuv.gov.ua/handle/123456789/135030 |
citation_txt |
Assembling of MoS₂-based photosensitive organic-inorganic nanocomposites by exfoliation-restacking technique / A.S. Golub, N.D. Lenenko, Yu.N. Novikov, B.M. Rumyantsev, S.B. Bibikov, T.S. Zhuravleva // Functional Materials. — 2006. — Т. 13, № 3. — С. 502-506. — Бібліогр.: 11 назв. — англ. |
series |
Functional Materials |
work_keys_str_mv |
AT golubas assemblingofmos2basedphotosensitiveorganicinorganicnanocompositesbyexfoliationrestackingtechnique AT lenenkond assemblingofmos2basedphotosensitiveorganicinorganicnanocompositesbyexfoliationrestackingtechnique AT novikovyun assemblingofmos2basedphotosensitiveorganicinorganicnanocompositesbyexfoliationrestackingtechnique AT rumyantsevbm assemblingofmos2basedphotosensitiveorganicinorganicnanocompositesbyexfoliationrestackingtechnique AT bibikovsb assemblingofmos2basedphotosensitiveorganicinorganicnanocompositesbyexfoliationrestackingtechnique AT zhuravlevats assemblingofmos2basedphotosensitiveorganicinorganicnanocompositesbyexfoliationrestackingtechnique |
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2023-10-18T21:08:16Z |
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