Electrodeposition of copper indium diselenide films using pulse plating technique
Parameters of rectangular potential pulse electolysis wich have provided the obtaining of nearly stoichiometric copper indium diselenide layers have been selected using the examination of those films by energy-dispersive X-ray spectroscopy, anodic stripping, scanning electron microscopy and the film...
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| Видавець: | НТК «Інститут монокристалів» НАН України |
|---|---|
| Дата: | 2007 |
| Автор: | |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2007
|
| Назва видання: | Functional Materials |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/136990 |
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| Цитувати: | Electrodeposition of copper indium diselenide films using pulse plating technique / N.P. Klochko // Functional Materials. — 2007. — Т. 14, № 3. — С. 343-346. — Бібліогр.: 9 назв. — англ. |
Репозиторії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
irk-123456789-136990 |
|---|---|
| record_format |
dspace |
| spelling |
irk-123456789-1369902018-06-17T03:08:19Z Electrodeposition of copper indium diselenide films using pulse plating technique Klochko, N.P. Parameters of rectangular potential pulse electolysis wich have provided the obtaining of nearly stoichiometric copper indium diselenide layers have been selected using the examination of those films by energy-dispersive X-ray spectroscopy, anodic stripping, scanning electron microscopy and the film resistivity measurements. 2007 Article Electrodeposition of copper indium diselenide films using pulse plating technique / N.P. Klochko // Functional Materials. — 2007. — Т. 14, № 3. — С. 343-346. — Бібліогр.: 9 назв. — англ. 1027-5495 http://dspace.nbuv.gov.ua/handle/123456789/136990 en Functional Materials НТК «Інститут монокристалів» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| description |
Parameters of rectangular potential pulse electolysis wich have provided the obtaining of nearly stoichiometric copper indium diselenide layers have been selected using the examination of those films by energy-dispersive X-ray spectroscopy, anodic stripping, scanning electron microscopy and the film resistivity measurements. |
| format |
Article |
| author |
Klochko, N.P. |
| spellingShingle |
Klochko, N.P. Electrodeposition of copper indium diselenide films using pulse plating technique Functional Materials |
| author_facet |
Klochko, N.P. |
| author_sort |
Klochko, N.P. |
| title |
Electrodeposition of copper indium diselenide films using pulse plating technique |
| title_short |
Electrodeposition of copper indium diselenide films using pulse plating technique |
| title_full |
Electrodeposition of copper indium diselenide films using pulse plating technique |
| title_fullStr |
Electrodeposition of copper indium diselenide films using pulse plating technique |
| title_full_unstemmed |
Electrodeposition of copper indium diselenide films using pulse plating technique |
| title_sort |
electrodeposition of copper indium diselenide films using pulse plating technique |
| publisher |
НТК «Інститут монокристалів» НАН України |
| publishDate |
2007 |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/136990 |
| citation_txt |
Electrodeposition of copper indium diselenide films using pulse plating technique / N.P. Klochko // Functional Materials. — 2007. — Т. 14, № 3. — С. 343-346. — Бібліогр.: 9 назв. — англ. |
| series |
Functional Materials |
| work_keys_str_mv |
AT klochkonp electrodepositionofcopperindiumdiselenidefilmsusingpulseplatingtechnique |
| first_indexed |
2023-10-18T21:14:45Z |
| last_indexed |
2023-10-18T21:14:45Z |
| _version_ |
1796152308700020736 |