Electrochemical deposition of cadmium telluride films
The mechanisms of electrochemical processes in the electrolyte for cadmium telluride semi-conducting film deposition and in corresponding partial solutions containing cadmium and tellurium ions have been studied by voltammetry with linear potential scanning and by cyclic voltammetry. The differences...
Збережено в:
| Дата: | 2008 |
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| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2008
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| Назва видання: | Functional Materials |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/137232 |
| Теги: |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Electrochemical deposition of cadmium telluride films / N.P. Klochko, N.D. Volkova, M.V. Dobrotvorskaya, V.R. Kopach, T.A. Li // Functional Materials. — 2008. — Т. 15, № 1. — С. 119-126. — Бібліогр.: 13 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | The mechanisms of electrochemical processes in the electrolyte for cadmium telluride semi-conducting film deposition and in corresponding partial solutions containing cadmium and tellurium ions have been studied by voltammetry with linear potential scanning and by cyclic voltammetry. The differences between cathodic processes on chemically inert titanium nitride substrates and catalytically active molybdenum surface have been revealed. Basing on these studies, the nature of impurities discovered in this work by X-ray photoelectron spectroscopy at the surface and inside the cadmium telluride films deposited on molybdenum and titanium nitride surfaces has been explained. The latter made it possible to select the electrodeposition parameters and the substrate material which provide the stoichiometric film composition. |
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