Peculiarities of Si-Ge whisker growing by CTR method

Growth peculiarities of doped Si₁₋ₓGeₓ (х = 0.01-0.05) solid solution whiskers of 1 to 100 µm in diameter in closed bromide system by chemical transport reactions method have been investigated. А dimensional dependence of specific resistance at 300 К has been revealed. The Si₁₋ₓGeₓ (х = 0.05) whisk...

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Збережено в:
Бібліографічні деталі
Дата:2005
Автори: Druzhinin, A.A., Ostrovskii, I.P., Khoverko, Yu.M., Gij, Ya.V.
Формат: Стаття
Мова:English
Опубліковано: НТК «Інститут монокристалів» НАН України 2005
Назва видання:Functional Materials
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/139317
Теги: Додати тег
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Peculiarities of Si-Ge whisker growing by CTR method / A.A. Druzhinin, I.P. Ostrovskii, Yu.M. Khoverko, Ya.V. Gij // Functional Materials. — 2005. — Т. 12, № 4. — С. 738-741. — Бібліогр.: 9 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Опис
Резюме:Growth peculiarities of doped Si₁₋ₓGeₓ (х = 0.01-0.05) solid solution whiskers of 1 to 100 µm in diameter in closed bromide system by chemical transport reactions method have been investigated. А dimensional dependence of specific resistance at 300 К has been revealed. The Si₁₋ₓGeₓ (х = 0.05) whiskers of 30 to 70 µm in diameter with dopant concentration in the vicinity of metal-insulator transition were obtained. Substantial changes of the specific resistance and gauge factor of the crystals depending on their diameters has been observed in temperature range 4.2-50 К.