Influence of Si on microstructure and mechanical properties of TiAISiN hard thin films
Structural and mechanical properties of nanocomposite TiAI(Si)N thin films prepared using arc-plasma PVD deposition technique on WC-Co substrates have been characterized by X-ray diffraction and nanoindentation. TEM have been used to study the microstructure of thin films, in order to understand the...
Збережено в:
| Дата: | 2004 |
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| Автори: | , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
НТК «Інститут монокристалів» НАН України
2004
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| Назва видання: | Functional Materials |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/139468 |
| Теги: |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Influence of Si on microstructure and mechanical properties of TiAISiN hard thin films / O.I. Nakonechna, M.I. Zakharenko // Functional Materials. — 2004. — Т. 11, № 3. — С. 541-545. — Бібліогр.: 17 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | Structural and mechanical properties of nanocomposite TiAI(Si)N thin films prepared using arc-plasma PVD deposition technique on WC-Co substrates have been characterized by X-ray diffraction and nanoindentation. TEM have been used to study the microstructure of thin films, in order to understand the growth mechanism thereof. The maximum hardness of thin films was observed for materials of near the Al-Si eutectic composition. The smallest grain size (30 nm) in the film corresponds also to that composition. |
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