XPS study of ammonia-exposed C₆₀ films both original and photopolymerized
Surface of C₆₀ films (original and photopolymerized with UV radiation) exposed to ammonia at different pressure was investigated by the method of X-ray photoelectron spectroscopy. Effect of X-ray stimulated interaction between films and adsorbed water, which resulted in bonds like C-O-H and enhanced...
Збережено в:
Дата: | 2004 |
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Автори: | , , , |
Формат: | Стаття |
Мова: | English |
Опубліковано: |
НТК «Інститут монокристалів» НАН України
2004
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Назва видання: | Functional Materials |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/139580 |
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Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | XPS study of ammonia-exposed C₆₀ films both original and photopolymerized / M.V. Dobrotvorska, V.A. Karachevtsev , O.M. Vovk , A.M. Rao // Functional Materials. — 2004. — Т. 11, № 4. — С. 755-760. — Бібліогр.: 27 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of UkraineРезюме: | Surface of C₆₀ films (original and photopolymerized with UV radiation) exposed to ammonia at different pressure was investigated by the method of X-ray photoelectron spectroscopy. Effect of X-ray stimulated interaction between films and adsorbed water, which resulted in bonds like C-O-H and enhanced by ammonia was detected. It was shown that ammonia unreacted chemically with C₆₀ films, both original and photo-polymerized. |
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