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Phase formation and crystallization of films deposited by pulse laser sputtering of chromium in oxygen atmosphere

Phase formation and crystallization of films deposited by pulse laser sputtering of chromium in oxygen atmosphere

Effects of the substrate temperature Tₛ (20-420 ℃) and the oxygen pressure in the evaporation chamber Р(О₂) (10⁻⁵-10⁻² Torr) on the structure and phase composition of films obtained by pulse laser sputtering of a chromium target have been studied by electron microscopy (using the...

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Bibliographic Details
Main Authors: Bagmut, A.G., Grigorov, S.N., Zhuchkov, V.A., Kolosov, V.Yu., Kosevich, V.M., Nikolaichuk, G.P.
Format: Article
Language:English
Published: НТК «Інститут монокристалів» НАН України 2006
Series:Functional Materials
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/140069
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http://dspace.nbuv.gov.ua/handle/123456789/140069

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