Physical mechanisms of microstructure formation in niobium films under low temperature ionic-atomic deposition

• Дата: 2006
• Автори: Marchenko, I.G., Neklyudov, I.M.
• Формат: Стаття
• Мова: English
• Опубліковано: НТК «Інститут монокристалів» НАН України 2006
• Назва видання: Functional Materials
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/140074
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: Physical mechanisms of microstructure formation in niobium films under low temperature ionic-atomic deposition / I.G. Marchenko, I.M. Neklyudov // Functional Materials. — 2006. — Т. 13, № 2. — С. 227-233. — Бібліогр.: 33 назв. — англ.

The molecular dynamics method has been used to study the effect of low-energy irradiation with self-ions on the microstructure and residual stresses arising in niobium films in the course of ion-atomic deposition. The ion flow constituted 10 % of the total atomic flow being deposited, the ion ener...