Comparison of blistering of W bulk and coatings under H₂, D₂ and He plasma irradiation

The surface topography of W bulk prepared by powder sintering (20 μm thickness) and W coatings deposited by cathodic arc evaporation and by argon ion sputtering was studied under the influence of low-energy hydrogen (deuterium) and helium plasma at room temperature. The surface modifications induc...

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Збережено в:
Бібліографічні деталі
Дата:2018
Автори: Nikitin, A.V., Kuprin, A.S., Tolstolutskaya, G.D., Vasilenko, R.L., Ovcharenko, V.D., Voyevodin, V.N.
Формат: Стаття
Мова:English
Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2018
Назва видання:Вопросы атомной науки и техники
Теми:
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/147033
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Comparison of blistering of w bulk and coatings under H₂, D₂ and He plasma irradiation / A.V. Nikitin, A.S. Kuprin, G.D. Tolstolutskaya, R.L. Vasilenko, V.D. Ovcharenko, V.N. Voyevodin // Вопросы атомной науки и техники. — 2018. — № 2. — С. 29-34. — Бібліогр.: 17 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Резюме:The surface topography of W bulk prepared by powder sintering (20 μm thickness) and W coatings deposited by cathodic arc evaporation and by argon ion sputtering was studied under the influence of low-energy hydrogen (deuterium) and helium plasma at room temperature. The surface modifications induced by the plasma irradiation were studied by scanning electron microscopy. It was observed formation of blisters and sputtering. After helium and deuterium plasma irradiation, numerous blisters were observed on the surface of W foils samples and coatings deposited by argon ion sputtering. The surface of W coatings deposited by cathodic arc evaporation was undergone only sputtering process under the same irradiation conditions.