Comparison of blistering of W bulk and coatings under H₂, D₂ and He plasma irradiation
The surface topography of W bulk prepared by powder sintering (20 μm thickness) and W coatings deposited by cathodic arc evaporation and by argon ion sputtering was studied under the influence of low-energy hydrogen (deuterium) and helium plasma at room temperature. The surface modifications induc...
Збережено в:
Дата: | 2018 |
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Автори: | , , , , , |
Формат: | Стаття |
Мова: | English |
Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2018
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Назва видання: | Вопросы атомной науки и техники |
Теми: | |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/147033 |
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Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | Comparison of blistering of w bulk and coatings under H₂, D₂ and He plasma irradiation / A.V. Nikitin, A.S. Kuprin, G.D. Tolstolutskaya, R.L. Vasilenko, V.D. Ovcharenko, V.N. Voyevodin // Вопросы атомной науки и техники. — 2018. — № 2. — С. 29-34. — Бібліогр.: 17 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of UkraineРезюме: | The surface topography of W bulk prepared by powder sintering (20 μm thickness) and W coatings deposited by
cathodic arc evaporation and by argon ion sputtering was studied under the influence of low-energy hydrogen
(deuterium) and helium plasma at room temperature. The surface modifications induced by the plasma irradiation
were studied by scanning electron microscopy. It was observed formation of blisters and sputtering. After helium
and deuterium plasma irradiation, numerous blisters were observed on the surface of W foils samples and coatings
deposited by argon ion sputtering. The surface of W coatings deposited by cathodic arc evaporation was undergone
only sputtering process under the same irradiation conditions. |
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