Structure of polycrystalline diamond coatings deposited by СVD method in the plasma of glow discharge with the use of pulse power supply

• Видавець: Національний науковий центр «Харківський фізико-технічний інститут» НАН України
• Дата: 2021
• Автори: Koshevoy, K.I., Volkov, Yu.Ya., Strel’nitskij, V.E., Reshetnyak, E.N.
• Формат: Стаття
• Мова: English
• Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2021
• Назва видання: Вопросы атомной науки и техники
• Теми: Physics of radiation and ion-plasma technologies
• Онлайн доступ: http://dspace.nbuv.gov.ua/handle/123456789/194957
• Цитувати: Structure of polycrystalline diamond coatings deposited by СVD method in the plasma of glow discharge with the use of pulse power supply / K.I. Koshevoy, Yu.Ya. Volkov, V.E. Strel’nitskij, E.N. Reshetnyak // Problems of Atomic Science and Technology. — 2021. — № 2. — С. 113-118. — Бібліогр.: 22 назв. — англ.

The structure of CVD carbon coatings synthesized in a hydrogen-methane mixture in the plasma of a glow discharge stabilized by a magnetic field using a pulsed power supply was studied by X-ray diffraction analysis and optical microscopy. The range of deposition parameters is determined, which ensure formation of polycrystalline diamond coatings. The coatings consist of diamond crystals with a clearly defined cut and the crystal lattice parameter close to the tabular value for natural diamond. The influence of the methane partial pressure in the gas mixture and the substrate temperature on the size and predominant orientation of diamond crystals in the coatings was determined. It is established that the use of the pulse mode and grounding of the substrate holder helps to improve the quality of diamond coatings.