Magnetic field dynamics in plasma opening switch
Computer simulations for magnetic field penetration into plasma of plasma opening switch (POS), and current loop formation in it are presented for various initial plasma densities, currents, and POS geometries. It is shown that the current loop dynamics in the POS is determined by the fast magnetic...
Збережено в:
Дата: | 2021 |
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Автори: | , , , , , , , |
Формат: | Стаття |
Мова: | English |
Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2021
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Назва видання: | Вопросы атомной науки и техники |
Теми: | |
Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/195638 |
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Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | Magnetic field dynamics in plasma opening switch / O.V. Manuilenko, I.M. Onishchenko, A.V. Pashchenko, I.A. Pashchenko, V.A. Soshenko, V.G. Svichensky, V.B. Yuferov, B.V. Zajtsev // Problems of Atomic Science and Technology. — 2021. — № 6. — С. 61-66. — Бібліогр.: 19 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of UkraineРезюме: | Computer simulations for magnetic field penetration into plasma of plasma opening switch (POS), and current loop formation in it are presented for various initial plasma densities, currents, and POS geometries. It is shown that the current loop dynamics in the POS is determined by the fast magnetic field penetration in plasma due to the Hall effect. The strong dependence of the current loop longitudinal velocity on the transverse coordinate, together with the influence of the boundary conditions at the POS cathode and anode, lead to the formation of the narrow S-shaped current loop even in a homogeneous plasma. It is shown that the control parameters influencing the dynamics of the magnetic field and the motion of the current loop in the POS are the initial plasma density, driving current and cathode radius. The POS resistance is calculated for wide range of initial plasma densities, currents, and cathode radiuses. It is shown, that POS resistance is proportional to the total current, inversely proportional to plasma density, and is in the range 10⁻³…1 Ω for plasma densities 10¹²…10¹⁵ cm⁻³. |
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