Affects deposition time and substrate temperature on optical properties of ZnO thin film
ZnO thin films have been prepared with different processes such as pulsed-laser deposition, chemical vapor deposition spray pyrolysis and sol-gel process etc. Among them, chemical vapor deposition (CVD), in this paper we will study the effect of, deposition time and temperature of the substrates. Th...
Збережено в:
| Дата: | 2011 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Науковий фізико-технологічний центр МОН та НАН України
2011
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| Назва видання: | Физическая инженерия поверхности |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/75998 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Affects deposition time and substrate temperature on optical properties of zno thin film / A.D. Pogrebnyak, N.Y. Jameel, G.A-K.M. Mommed // Физическая инженерия поверхности. — 2011. — Т. 9, № 1. — С. 21-24. — Бібліогр.: 6 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | ZnO thin films have been prepared with different processes such as pulsed-laser deposition, chemical vapor deposition spray pyrolysis and sol-gel process etc. Among them, chemical vapor deposition (CVD), in this paper we will study the effect of, deposition time and temperature of the substrates. The temperatures of substrate was varied as was the deposition time of ZnO in order to determine the best substrate temperature and deposition time to produce the best physical properties of deposition.
using pure zinc acetate hydrous Zn(Ch₃COO)₂⋅2H₂0 with 98% purity. The best deposition time was found to be (20 min) while the best temperature degree was (500 °C). |
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