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High-productive source of the cathodic vacuum-arc plasma with the rectilinear filter
The design and performance of high productive cathodic vacuum arc plasma source with rectilinear “magnetic island” filter, which is suitable for industrial applications, are briefly described. The device is characterized by achievable output ion current up to 4 A at an arc current of 100 A, Ti coa...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
National Science Centеr “Kharkov Institute of Physics and Technology”, Kharkov, Ukraine
2013
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/79933 |
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| Summary: | The design and performance of high productive cathodic vacuum arc plasma source with rectilinear “magnetic
island” filter, which is suitable for industrial applications, are briefly described. The device is characterized by
achievable output ion current up to 4 A at an arc current of 100 A, Ti coating deposition rate at a distance of
150 mm from the outlet is 20 micron/hour within the circle of 180 mm diameter. In terms of productivity and quality
of plasma purification from particulates the developed plasma source is superior to world analogues by 1.5...2 times. |
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