Thin film nanopores (V, 10Ti)NxHy hydrogen storages
This scientific paper delves into the findings of the investigation carried out to determine the adsorption and electrophysical characteristics of nanoporous (V, 10 at.% Ti)Nx films obtained using the ion beam-assisted deposition technique (IBAD). It has been shown that these films can accumulate mo...
Збережено в:
| Дата: | 2014 |
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| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2014
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/79964 |
| Теги: |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Thin film nanopores (V, 10Ti)NxHy hydrogen storages / A.G. Guglya, Yu.A. Marchenko, E.S. Melnikova, V.V. Vlasov, E.N. Zubarev // Вопросы атомной науки и техники. — 2014. — № 2. — С. 162-166. — Бібліогр.: 15 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | This scientific paper delves into the findings of the investigation carried out to determine the adsorption and electrophysical characteristics of nanoporous (V, 10 at.% Ti)Nx films obtained using the ion beam-assisted deposition technique (IBAD). It has been shown that these films can accumulate more than 7 wt.% hydrogen at a relatively low pressure of 0,5 MPa. One part of it is accumulated in the grain boundaries and pores but another one forms the hydride phase. A complete release of hydrogen occurs at a temperature of 250 °C. During the hydrogen desorption the specific resistivity of (V, 10Ti)NxHy films is roughly increased by a factor of 10⁷. |
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