Electron sources for plasma electronics and different technological application
There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plas...
Збережено в:
| Дата: | 2002 |
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| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2002
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/80310 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ. |
Репозитарії
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irk-123456789-80310 |
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irk-123456789-803102015-04-15T03:02:21Z Electron sources for plasma electronics and different technological application Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. Plasma electronics There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plasma-generating gas [1-5]. The given work aims at constructing the guns with the parameters necessary for the excitation of microwaves of high amplitudes in the slow-wave structures: the beam energy is 20-30 kV, the current is up to 5 A, and the pulse duration is 0,11÷1 ms. The principal problem arising during construction of heavy-current electron sources with plasma emitters consists in the following: it is necessary to provide such conditions of the gas volume, under which the discharge firing would be stable and the emissive plasma generation be effective, whereas a gas breakdown in the accelerating gap must be eliminated. 2002 Article Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ. 1562-6016 PACS: 52.80.-s; 52.77.-j http://dspace.nbuv.gov.ua/handle/123456789/80310 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| topic |
Plasma electronics Plasma electronics |
| spellingShingle |
Plasma electronics Plasma electronics Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. Electron sources for plasma electronics and different technological application Вопросы атомной науки и техники |
| description |
There are the following advantages of applying electron guns with plasma cathodes in devices exciting microwave radiation: stability of their parameters, high density of current, relative insensitivity to ion bombardment and the possibility of operating over a wide range of pressure values of a plasma-generating gas [1-5]. The given work aims at constructing the guns with the parameters necessary for the excitation of microwaves of high amplitudes in the slow-wave structures: the beam energy is 20-30 kV, the current is up to 5 A, and the pulse duration is 0,11÷1 ms. The principal problem arising during construction of heavy-current electron sources with plasma emitters consists in the following: it is necessary to provide such conditions of the gas volume, under which the discharge firing would be stable and the emissive plasma generation be effective, whereas a gas breakdown in the accelerating gap must be eliminated. |
| format |
Article |
| author |
Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. |
| author_facet |
Antipov, V.S. Bez’yazyshny, I.A. Berezhnaya, I.V. Kornilov, E.A. |
| author_sort |
Antipov, V.S. |
| title |
Electron sources for plasma electronics and different technological application |
| title_short |
Electron sources for plasma electronics and different technological application |
| title_full |
Electron sources for plasma electronics and different technological application |
| title_fullStr |
Electron sources for plasma electronics and different technological application |
| title_full_unstemmed |
Electron sources for plasma electronics and different technological application |
| title_sort |
electron sources for plasma electronics and different technological application |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2002 |
| topic_facet |
Plasma electronics |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/80310 |
| citation_txt |
Electron sources for plasma electronics and different technological application / V.S. Antipov, I.A. Bez’yazyshny, I.V. Berezhnaya, E.A. Kornilov // Вопросы атомной науки и техники. — 2002. — № 4. — С. 155-157. — Бібліогр.: 4 назв. — англ. |
| series |
Вопросы атомной науки и техники |
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AT antipovvs electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication AT bezyazyshnyia electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication AT berezhnayaiv electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication AT kornilovea electronsourcesforplasmaelectronicsanddifferenttechnologicalapplication |
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2023-10-18T19:20:38Z |
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